Electrical, optical, and structural properties of ITO co-sputtered IZO films by dual target magnetron sputtering

被引:10
作者
Jeong, Jin-A [1 ]
Choi, Kwang-Hyuk [1 ]
Bae, Jung-Hyeok [1 ]
Moon, Jong-Min [1 ]
Jeong, Soon Wook [1 ]
Kim, Insoo [1 ]
Kim, Han-Ki [1 ]
Yi, Min-Su [2 ]
机构
[1] Kumoh Natl Inst Technol, Sch Adv Mat & Syst Engn, Gumi 730701, Gyeongbuk, South Korea
[2] Kyoungbuk Natl Univ, Dept Mat Sci & Engn, Sangju 742711, Gyeongbuk, South Korea
关键词
Co-sputtered IZO; ITO; IZTO; Work function; DC magnetron sputter; OXIDE-FILMS; INDIUM-OXIDE; THIN-FILMS; TRANSPARENT; ALTERNATIVES;
D O I
10.1007/s10832-008-9468-4
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We have investigated electrical, optical, and structural properties of indium tin oxide (ITO) co-sputtered indium zinc oxide (IZO) film prepared by a dual target direct current (DC) magnetron sputtering at room temperature in pure Ar ambient. It was shown that the resistivity and sheet resistance of ITO co-sputtered IZO films monotonically increased with increasing DC power of ITO target at constant DC power of IZO target. Synchrotron X-ray scattering and scanning electron microscope examination results show that addition of ITO in the IZO film lead to crystallization of IZTO film due to low transition temperature of the ITO from amorphous to crystalline. However, ITO co-sputtered IZO film (ITO/IZO power = 100 W:100 W) exhibit higher work function than those of pure IZO and ITO film. It was found that the work function as well as the electrical, optical, and surface properties of the IZTO film could be controlled by varying the DC power of IZO and ITO targets, respectively.
引用
收藏
页码:361 / 366
页数:6
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