Boron-Rich Plasma of High Current Pulsed Vacuum Arc with Lanthanum Hexaboride Cathode

被引：0

作者：

Frolova, V. P. ^{[1
]}

Nikolaev, A. G. ^{[1
]}

Oks, E. M. ^{[1
,2
]}

Savkin, K. P. ^{[1
]}

Shandrikov, M. V. ^{[1
]}

Vizir, A. V. ^{[1
]}

Yushkov, G. Yu. ^{[1
]}

机构：

[1] Inst High Current Elect SB RAS, 2-3 Acad Sky Ave, Tomsk 634055, Russia

[2] Tomsk State Univ Control Syst & Radioelect, Tomsk 634050, Russia

来源：

2016 27TH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM (ISDEIV), VOL 2 | 2016年

基金：

俄罗斯科学基金会;

关键词：

ION-IMPLANTATION; DEPOSITION; SPOTS; GAS;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Boron plasmas are widely used in various ion beam and plasma technologies, including semiconductor ion doping. Of interest is also its use for deposition of hard coatings and surface modification to enhance the performance and lifetime of machine parts and tools. The paper reports on the generation of boron-rich plasma in a short high-current pulsed vacuum arc with a lanthanum hexaboride cathode, presents time-of-flight data on its mass-charge state, and discusses the influence of the arc parameters on the ion constitution of the boron-rich plasma.

引用

页数：4

共 21 条

[1] METAL PLASMA IMMERSION ION-IMPLANTATION AND DEPOSITION USING VACUUM-ARC PLASMA SOURCES [J].

ANDERS, A ;

ANDERS, S ;

BROWN, IG ;

DICKINSON, MR ;

MACGILL, RA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1994, 12 (02) :815-820

[2] Cathodic arcs: Fractal voltage and cohesive energy rule [J].

Anders, A ;

Oks, EM ;

Yushkov, GY .

APPLIED PHYSICS LETTERS, 2005, 86 (21) :1-3

[3] Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field [J].

Anders, A ;

Yushkov, GY .

JOURNAL OF APPLIED PHYSICS, 2002, 91 (08) :4824-4832

[4] Structure and time behavior of vacuum arc cathode spots [J].

Barengolts, SA ;

Mesyats, GA ;

Shmelev, DL .

IEEE TRANSACTIONS ON PLASMA SCIENCE, 2003, 31 (05) :809-816

[5] Vacuum arc deposition devices [J].

Boxman, RL ;

Zhitomirsky, VN .

REVIEW OF SCIENTIFIC INSTRUMENTS, 2006, 77 (02)

[6] VACUUM-ARC ION SOURCES [J].

BROWN, IG .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1994, 65 (10) :3061-3082

[7] Study of directed ion velocities in a vacuum arc by an emission method [J].

Bugaev, AS ;

Gushenets, VI ;

Nikolaev, AG ;

Oks, EM ;

Yushkov, GY .

TECHNICAL PHYSICS, 2000, 45 (09) :1135-1140

[8] Boron ion source based on planar magnetron discharge in self-sputtering mode [J].

Gushenets, V. I. ;

Hershcovitch, A. ;

Kulevoy, T. V. ;

Oks, E. M. ;

Savkin, K. P. ;

Vizir, A. V. ;

Yushkov, G. Yu. .

REVIEW OF SCIENTIFIC INSTRUMENTS, 2010, 81 (02)

[9] Cathode spots of electric arcs [J].

Jüttner, B .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2001, 34 (17) :R103-R123

[10] Amorphous boron coatings produced with vacuum arc deposition technology [J].

Klepper, CC ;

Hazelton, RC ;

Yadlowsky, EJ ;

Carlson, EP ;

Keitz, MD ;

Williams, JM ;

Zuhr, RA ;

Poker, DB .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2002, 20 (03) :725-732

← 1 2 3 →