Physical models for smart-power devices

被引:1
作者
Rudan, M. [1 ]
Reggiani, S. [1 ]
Gnani, E. [1 ]
Baccarani, G. [1 ]
Corvasce, C. [2 ]
Ciappa, M. [2 ]
Stecher, M. [3 ]
Pogany, D. [4 ]
Gornik, E. [4 ]
机构
[1] Univ Bologna, ARCES, Bologna, Italy
[2] ETH Zentrum, IIS, Zurich, Switzerland
[3] Infineon Technol AG, Munich, Germany
[4] Vienna Univ Technol, ISSE, Vienna, Austria
来源
PROCEEDINGS OF THE INTERNATIONAL CONFERENCE MIXED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS | 2006年
关键词
electrostatic-discharge (EDS) events; high-temperature device characterization; impact-ionization; Hall-voltage measurements;
D O I
10.1109/MIXDES.2006.1706531
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A careful prediction of the carrier mobility and impact-ionization generation is essential for the design of devices working in high-current/voltage conditions, where self-heating is relevant. Recently, some of the Authors presented new physically-based models for both mobility and impact ionization, which have been validated up to very high operating temperatures. Such work is based on theoretical analyses, that confimed both the numerical and experimental findings about the field and temperature dependencies. The availability of such models provides the background for the realization of predictive simulation tools for power and electrostatic-discharge protection devices.
引用
收藏
页码:28 / +
页数:2
相关论文
共 24 条
[1]  
AG ISE, 2002, ISE TCAD REL 8 5 ISE
[2]   TEMPERATURE-DEPENDENCE OF THE ELECTRON-IMPACT IONIZATION COEFFICIENT IN SILICON [J].
ERSHOV, M ;
RYZHII, V .
SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1995, 10 (02) :138-142
[3]  
ESMARK K, 2000, 38 ANN INT REL PHYS, P304
[4]  
Gnani E., 2002, ESSDERC 2002. Proceedings of the 32nd European Solid-State Device Research Conference, P227
[5]  
GRANT WN, 1973, SOLID STATE ELECT, V16
[6]   AVALANCHE MULTIPLICATION IN SEMICONDUCTORS - A MODIFICATION OF CHYNOWETHS LAW [J].
LACKNER, T .
SOLID-STATE ELECTRONICS, 1991, 34 (01) :33-42
[7]   IMPACT IONIZATION IN SILICON - A REVIEW AND UPDATE [J].
MAES, W ;
DEMEYER, K ;
VANOVERSTRAETEN, R .
SOLID-STATE ELECTRONICS, 1990, 33 (06) :705-718
[8]   MODELING OF CARRIER MOBILITY AGAINST CARRIER CONCENTRATION IN ARSENIC-DOPED, PHOSPHORUS-DOPED, AND BORON-DOPED SILICON [J].
MASETTI, G ;
SEVERI, M ;
SOLMI, S .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1983, 30 (07) :764-769
[9]   THRESHOLD ENERGY EFFECT ON AVALANCHE BREAKDOWN VOLTAGE IN SEMICONDUCTOR JUNCTIONS [J].
OKUTO, Y ;
CROWELL, CR .
SOLID-STATE ELECTRONICS, 1975, 18 (02) :161-168
[10]  
OUWERLING GJL, 1989, SHORT COURSE SOFTWAR, P78