Hot-Carrier-Damage-Induced Current Gain Enhancement (CGE) Effects in SiGe HBTs

被引:11
|
作者
Raghunathan, Uppili S. [1 ]
Martinez, Rafael Perez [1 ]
Wier, Brian R. [1 ]
Omprakash, Anup P. [1 ]
Ying, Hanbin [1 ]
Bantu, Tikurete G. [2 ]
Yasuda, Hiroshi [2 ]
Menz, Philipp [3 ]
Cressler, John D. [1 ]
机构
[1] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
[2] Texas Instruments Inc, Dallas, TX 75243 USA
[3] Texas Instruments Deutschland Gmbh, D-85356 Freising Weihenstephan, Germany
关键词
Annealing; avalanche generation; bipolar transistor; current gain enhancement (CGE); degradation; hot carriers; impact ionization; mixed-mode stress; polysilicon; reliability; reverse emitter-base (EB) stress; SiGe HBT; EMITTER; POLYSILICON; RECOMBINATION; RELIABILITY; RESISTANCES; TRANSISTORS; STRESS; BASE;
D O I
10.1109/TED.2018.2829184
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We investigate high current stress mechanisms and demonstrate how Auger hot carriers can damage both oxide interfaces and polysilicon regions of the emitter and base. A new current gain enhancement (CGE) effect is proposed, which involves hot-carrier damage to the polysilicon emitter and extrinsic base leading to the degradation of the associated minority carrier mobilities. We demonstrate the different CGE mechanisms in SiGe HBTs under forward and inverse modes of operation. The hot-carrier damage responsible for CGE at high injection is explored in depth with the help of TCAD simulations. Evidence for this effect has been gathered with good statistical significance from various stress conditions, various technologies, complimentary (NPN + PNP) devices, and from dc and ac measurements. The new polysilicon degradation mechanism proposed in this paper has been generalized and is important for accurately modeling the changes in base resistance and current gain (beta) at high injection, where circuits are typically biased to extract maximum device performance.
引用
收藏
页码:2430 / 2438
页数:9
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