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Electrical and Optical Properties of Stacking Faults Introduced by Plastic Deformation in 4H-SiC
被引:3
作者:
Pichaud, B.
[1
,2
]
Regula, G.
[1
,2
]
Yakimov, E. B.
[3
]
机构:
[1] Aix Marseille Univ, CNRS, IM2NP, UMR 7334, F-13397 Marseille, France
[2] Univ Toulon & Var, CNRS, UMR 7334, F-83957 La Garde, France
[3] RAS, Inst Microelect Technol, Chernogolovka 142432, Russia
来源:
INTERNATIONAL CONFERENCE ON DEFECTS IN SEMICONDUCTORS 2013
|
2014年
/
1583卷
关键词:
SiC;
stacking faults;
EBIC;
CL;
plastic deformation;
D O I:
10.1063/1.4865626
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The electrical and optical properties of stacking faults (SFs) introduced by plastic deformation in 4H-SiC were studied by Electron Beam Induced Current (EBIC) and cathodoluminescence (CL) methods. Partial dislocations and stacking faults in the (0001) glide planes perpendicular to the surface were introduced in n-type 4H-SiC under a well-controlled state of stress by cantilever bending at 550 degrees C. CL measurements allow determining the multiplicity of the SFs (single or double). It is observed that the overwhelming majority of stacking faults are double Shockley type SFs (CL emission at 504 nm) that correlates well with previously published high resolution transmission electron microscopy (HRTEM) investigations. However, single Shockley type SFs (CL emission at 422 nm) of much smaller lengths are also observed in some areas near the scratched region from where the defects are nucleated. This suggests that the velocity of partial dislocation pairs under a given applied stress could be higher than that of single partial dislocations. It is also shown that in the EBIC mode, SFs produce a strong bright contrast, which can be explained by considering the SFs in 4H-SiC to be quantum wells of II type.
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页码:161 / 164
页数:4
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