共 10 条
Suppression of Current Collapse in Enhancement-Mode AlGaN/GaN High Electron Mobility Transistors
被引:21
作者:

Wang, Chih-Hao
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan

Ho, Shin-Yi
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan

Huang, Jian Jang
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Inst Photon & Optoelect, Dept Elect Engn, Taipei 10617, Taiwan Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan
机构:
[1] Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan
[2] Natl Taiwan Univ, Inst Photon & Optoelect, Dept Elect Engn, Taipei 10617, Taiwan
关键词:
HEMT;
enhancement mode;
current collapse;
SURFACE-STATES;
GATE METAL;
HEMTS;
IMPACT;
PERFORMANCE;
D O I:
10.1109/LED.2015.2498623
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The phenomenon of current collapse was investigated on p-GaN/AlGaN/GaN enhancement-mode high electron mobility transistors. Contrary to our original thought of carrier depletion on the p-GaN/AlGaN/GaN layers so that less carrier traps, current collapse was observed from such a device without surface passivation. The results were compared with the device passivated with SiO2 dielectric, which showed much less severe current collapse within the gate bias of -15 V. To understand the mechanism of dielectric passivation, the capacitance-voltage measurement was performed. Our results show that the donor-like dislocations in the SiO2/GaN interface help to deplete carriers on the device surface and within the p-GaN, thus maintaining channel carriers and mitigating current collapse.
引用
收藏
页码:74 / 76
页数:3
相关论文
共 10 条
[1]
High-performance enhancement-mode AlGaN/GaN HEMTs using fluoride-based plasma treatment
[J].
Cai, Y
;
Zhou, YG
;
Chen, KJ
;
Lau, KM
.
IEEE ELECTRON DEVICE LETTERS,
2005, 26 (07)
:435-437

Cai, Y
论文数: 0 引用数: 0
h-index: 0
机构:
Hong Kong Univ Sci & Technol, Dept Elect & Elect Engn, Kowloon, Hong Kong, Peoples R China Hong Kong Univ Sci & Technol, Dept Elect & Elect Engn, Kowloon, Hong Kong, Peoples R China

Zhou, YG
论文数: 0 引用数: 0
h-index: 0
机构:
Hong Kong Univ Sci & Technol, Dept Elect & Elect Engn, Kowloon, Hong Kong, Peoples R China Hong Kong Univ Sci & Technol, Dept Elect & Elect Engn, Kowloon, Hong Kong, Peoples R China

Chen, KJ
论文数: 0 引用数: 0
h-index: 0
机构:
Hong Kong Univ Sci & Technol, Dept Elect & Elect Engn, Kowloon, Hong Kong, Peoples R China Hong Kong Univ Sci & Technol, Dept Elect & Elect Engn, Kowloon, Hong Kong, Peoples R China

Lau, KM
论文数: 0 引用数: 0
h-index: 0
机构:
Hong Kong Univ Sci & Technol, Dept Elect & Elect Engn, Kowloon, Hong Kong, Peoples R China Hong Kong Univ Sci & Technol, Dept Elect & Elect Engn, Kowloon, Hong Kong, Peoples R China
[2]
Current Collapse Suppression by Gate Field-Plate in AlGaN/GaN HEMTs
[J].
Hasan, Md. Tanvir
;
Asano, Takashi
;
Tokuda, Hirokuni
;
Kuzuhara, Masaaki
.
IEEE ELECTRON DEVICE LETTERS,
2013, 34 (11)
:1379-1381

Hasan, Md. Tanvir
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Fukui, Grad Sch Engn, Fukui 9108507, Japan Univ Fukui, Grad Sch Engn, Fukui 9108507, Japan

Asano, Takashi
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Fukui, Grad Sch Engn, Fukui 9108507, Japan Univ Fukui, Grad Sch Engn, Fukui 9108507, Japan

Tokuda, Hirokuni
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Fukui, Grad Sch Engn, Fukui 9108507, Japan Univ Fukui, Grad Sch Engn, Fukui 9108507, Japan

Kuzuhara, Masaaki
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Fukui, Grad Sch Engn, Fukui 9108507, Japan Univ Fukui, Grad Sch Engn, Fukui 9108507, Japan
[3]
Impact of Channel Hot Electrons on Current Collapse in AlGaN/GaN HEMTs
[J].
Hwang, Injun
;
Kim, Jongseob
;
Chong, Soogine
;
Choi, Hyun-Sik
;
Hwang, Sun-Kyu
;
Oh, Jaejoon
;
Shin, Jai Kwang
;
Chung, U-In
.
IEEE ELECTRON DEVICE LETTERS,
2013, 34 (12)
:1494-1496

论文数: 引用数:
h-index:
机构:

论文数: 引用数:
h-index:
机构:

Chong, Soogine
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea

Choi, Hyun-Sik
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea

论文数: 引用数:
h-index:
机构:

Oh, Jaejoon
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea

Shin, Jai Kwang
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea

Chung, U-In
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea
[4]
p-GaN Gate HEMTs With Tungsten Gate Metal for High Threshold Voltage and Low Gate Current
[J].
Hwang, Injun
;
Kim, Jongseob
;
Choi, Hyuk Soon
;
Choi, Hyoji
;
Lee, Jaewon
;
Kim, Kyung Yeon
;
Park, Jong-Bong
;
Lee, Jae Cheol
;
Ha, Jongbong
;
Oh, Jaejoon
;
Shin, Jaikwang
;
Chung, U-In
.
IEEE ELECTRON DEVICE LETTERS,
2013, 34 (02)
:202-204

论文数: 引用数:
h-index:
机构:

论文数: 引用数:
h-index:
机构:

Choi, Hyuk Soon
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea

Choi, Hyoji
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea

Lee, Jaewon
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea

Kim, Kyung Yeon
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea

Park, Jong-Bong
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea

Lee, Jae Cheol
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea

Ha, Jongbong
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea

Oh, Jaejoon
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea

Shin, Jaikwang
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea

Chung, U-In
论文数: 0 引用数: 0
h-index: 0
机构:
Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea Samsung Elect Co Ltd, Samsung Adv Inst Technol, Yongin 446712, South Korea
[5]
Influence of surface states on the two-dimensional electron gas in AlGaN/GaN heterojunction field-effect transistors
[J].
Jogai, B
.
JOURNAL OF APPLIED PHYSICS,
2003, 93 (03)
:1631-1635

Jogai, B
论文数: 0 引用数: 0
h-index: 0
机构:
USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
[6]
Improvement of Current Collapse by Surface Treatment and Passivation Layer in p-GaN Gate GaN High-Electron-Mobility Transistors
[J].
Katsuno, Takashi
;
Kanechika, Masakazu
;
Itoh, Kenji
;
Nishikawa, Koichi
;
Uesugi, Tsutomu
;
Kachi, Tetsu
.
JAPANESE JOURNAL OF APPLIED PHYSICS,
2013, 52 (04)

Katsuno, Takashi
论文数: 0 引用数: 0
h-index: 0
机构:
Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan

Kanechika, Masakazu
论文数: 0 引用数: 0
h-index: 0
机构:
Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan

Itoh, Kenji
论文数: 0 引用数: 0
h-index: 0
机构:
Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan

Nishikawa, Koichi
论文数: 0 引用数: 0
h-index: 0
机构:
Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan

Uesugi, Tsutomu
论文数: 0 引用数: 0
h-index: 0
机构:
Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan

Kachi, Tetsu
论文数: 0 引用数: 0
h-index: 0
机构:
Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan Toyota Cent Res & Dev Labs Inc, Nagakute, Aichi 4801192, Japan
[7]
Impact of Gate Metal on the Performance of p-GaN/AlGaN/GaN High Electron Mobility Transistors
[J].
Lee, Finella
;
Su, Liang-Yu
;
Wang, Chih-Hao
;
Wu, Yuh-Renn
;
Huang, Jianjang
.
IEEE ELECTRON DEVICE LETTERS,
2015, 36 (03)
:232-234

Lee, Finella
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan

Su, Liang-Yu
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan

Wang, Chih-Hao
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan

Wu, Yuh-Renn
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan

Huang, Jianjang
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Inst Photon & Optoelect, Dept Elect Engn, Taipei 10617, Taiwan Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan
[8]
Enhancement-Mode GaN-Based High-Electron Mobility Transistors on the Si Substrate With a P-Type GaN Cap Layer
[J].
Su, Liang-Yu
;
Lee, Finella
;
Huang, Jian Jang
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
2014, 61 (02)
:460-465

Su, Liang-Yu
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan

Lee, Finella
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan

Huang, Jian Jang
论文数: 0 引用数: 0
h-index: 0
机构:
Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan
Natl Taiwan Univ, Dept Elect Engn, Taipei 10617, Taiwan Natl Taiwan Univ, Inst Photon & Optoelect, Taipei 10617, Taiwan
[9]
Gate injection transistor (GIT) - A normally-off AlGaN/GaN power transistor using conductivity modulation
[J].
Uemoto, Yasuhiro
;
Hikita, Masahiro
;
Ueno, Hiroaki
;
Matsuo, Hisayoshi
;
Ishida, Hidetoshi
;
Yanagihara, Manabu
;
Ueda, Tetsuzo
;
Tanaka, Tsuyoshi
;
Ueda, Daisuke
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
2007, 54 (12)
:3393-3399

Uemoto, Yasuhiro
论文数: 0 引用数: 0
h-index: 0
机构:
Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan

Hikita, Masahiro
论文数: 0 引用数: 0
h-index: 0
机构:
Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan

Ueno, Hiroaki
论文数: 0 引用数: 0
h-index: 0
机构:
Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan

Matsuo, Hisayoshi
论文数: 0 引用数: 0
h-index: 0
机构:
Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan

Ishida, Hidetoshi
论文数: 0 引用数: 0
h-index: 0
机构:
Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan

Yanagihara, Manabu
论文数: 0 引用数: 0
h-index: 0
机构:
Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan

Ueda, Tetsuzo
论文数: 0 引用数: 0
h-index: 0
机构:
Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan

Tanaka, Tsuyoshi
论文数: 0 引用数: 0
h-index: 0
机构:
Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan

Ueda, Daisuke
论文数: 0 引用数: 0
h-index: 0
机构:
Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan Matsushita Elect Ind Co Ltd, Semiconductor Co, Semiconductor Dev Res Ctr, Kyoto 6178520, Japan
[10]
The impact of surface states on the DC and RF characteristics of A1GaN/GaN HFETs
[J].
Vetury, R
;
Zhang, NQQ
;
Keller, S
;
Mishra, UK
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
2001, 48 (03)
:560-566

Vetury, R
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA

Zhang, NQQ
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA

Keller, S
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA

Mishra, UK
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA Univ Calif Santa Barbara, Dept Elect & Comp Engn, Santa Barbara, CA 93106 USA