Analysis of interface reactions of TiAl/Al2O3 and TiAl/TiO2 by the use of chemical potential diagram

被引:0
|
作者
Inaba, H
Murata, Y
机构
[1] KAWASAKI STEEL CHEM IND CO LTD, TECH RES LABS, CHUO KU, CHIBA 260, JAPAN
[2] NAGOYA UNIV, FAC ENGN, DEPT MAT & ENGN, CHIKUSA KU, NAGOYA, AICHI 46401, JAPAN
关键词
reaction path; chemical potential diagram; Ti-Al-O system; interface; diffusion couple; TiAl; THERMODYNAMIC ANALYSIS; OXIDATION BEHAVIOR; REACTION PROFILES; O SYSTEM; ALLOYS; AL; ALUMINA;
D O I
10.2109/jcersj.105.740
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Interface reactions for the diffusion couples of TiAl/Al2O3 and TiAl/TiO2 were investigated and the reaction paths were analyzed by the use of chemical potential diagram. No essential reaction was observed at 1273 K for the diffusion couple of TiAl/Al2O3, but Ti3Al(O) was formed between TiAl(O) and Al2O3 phases at 1373 K. In the case of TiAl/TiO2, Ti3Al(O) and Al2O3 were formed between TiAl(O) and TiO2 phases. These reaction paths were reasonably elucidated by the use of chemical potential diagram of the Ti-Al-O system, which was constructed using the data of Gibbs energy of formation for the compounds composed of Ti, Al and O. The reaction paths for the diffusion couple of Ti/Al2O3 and oxidation of TiAl obtained from the literature data were also reasonably elucidated by the use of the same chemical potential diagram.
引用
收藏
页码:740 / 745
页数:6
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