On the Dynamic characteristics of Ferroelectric and Paraelectric FETs

被引:0
作者
Kumar, Ashwani [1 ]
De Souza, M. M. [1 ]
机构
[1] Univ Sheffield, EEE Dept, Sheffield, S Yorkshire, England
来源
2018 IEEE 2ND ELECTRON DEVICES TECHNOLOGY AND MANUFACTURING CONFERENCE (EDTM 2018) | 2018年
关键词
Dynamic Behavior; Ferroelectric; Paraelectric; FET;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We derive the necessary conditions for a steep subthreshold switching of a Paraelectric FET with gate scan frequency. Despite an absence of a two valley energy profile, paraelectric FETs can be represented by a series R-C circuit that exhibit sub-60 mV/dec switching under dynamic conditions during the reverse sweep of the gate bias.
引用
收藏
页码:184 / 186
页数:3
相关论文
共 10 条
[1]  
Duarte JP, 2016, INT EL DEVICES MEET
[2]   Negative Capacitance Field Effect Transistor With Hysteresis-Free Sub-60-mV/Decade Switching [J].
Jo, Jaesung ;
Shin, Changhwan .
IEEE ELECTRON DEVICE LETTERS, 2016, 37 (03) :245-248
[3]   Negative Capacitance Behavior in a Leaky Ferroelectric [J].
Khan, Asif Islam ;
Radhakrishna, Ujwal ;
Chatterjee, Korok ;
Salahuddin, Sayeef ;
Antoniadis, Dimitri A. .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2016, 63 (11) :4416-4422
[4]  
Khan AI, 2015, NAT MATER, V14, P182, DOI [10.1038/nmat4148, 10.1038/NMAT4148]
[5]   Impact of Parasitic Capacitance and Ferroelectric Parameters on Negative Capacitance FinFET Characteristics [J].
Khandelwal, Sourabh ;
Duarte, Juan Pablo ;
Khan, Asif Islam ;
Salahuddin, Sayeef ;
Hu, Chenming .
IEEE ELECTRON DEVICE LETTERS, 2017, 38 (01) :142-144
[6]  
Landau L. D., 1954, Dokl. Akad. Nauk SSSR, V96, P469
[7]   Low-voltage transparent electric-double-layer ZnO-based thin-film transistors for portable transparent electronics [J].
Lu, Aixia ;
Sun, Jia ;
Jiang, Jie ;
Wan, Qing .
APPLIED PHYSICS LETTERS, 2010, 96 (04)
[8]   Condition for the negative capacitance effect in metal-ferroelectric-insulator-semiconductor devices [J].
Rusu, Alexandru ;
Saeidi, Ali ;
Ionescu, Adrian M. .
NANOTECHNOLOGY, 2016, 27 (11)
[9]  
Song J., 2016, MONOLITHIC INTEGRATI, V5, P612
[10]   Ferroelectric HfZrOx Ge and GeSn PMOSFETs with Sub-60 mV/decade Subthreshold Swing, Negligible Hysteresis, and Improved IDS [J].
Zhou, Jiuren ;
Han, Genquan ;
Li, Qinglong ;
Peng, Yue ;
Lu, Xiaoli ;
Zhang, Chunfu ;
Zhang, Jincheng ;
Sun, Qing-Qing ;
Zhang, David Wei ;
Hao, Yue .
2016 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM), 2016,