Laboratory methods for investigations of multilayer mirrors in extreme ultraviolet and soft X-ray region

被引：48

作者：

Bibishkin, MS ^{[1
]}

Chekhonadskih, DP ^{[1
]}

Chkhalo, NI ^{[1
]}

Kluyenkov, EB ^{[1
]}

Pestov, AE ^{[1
]}

Salashchenko, NN ^{[1
]}

Shmaenok, LA ^{[1
]}

Zabrodin, IG ^{[1
]}

Zuev, SY ^{[1
]}

机构：

[1] Inst Phys & Microstruct, Nizhnii Novgorod 603950, Russia

来源：

MICRO- AND NANOELECTRONICS 2003 | 2004年 / 5401卷

关键词：

extreme ultraviolet lithography; X-ray radiation; X-ray tube; reflectometry; multilayer structure;

D O I：

10.1117/12.556949

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

In the paper, we report development of two reflectometers in IPM RAS. One enables investigation of the angular and spectral characteristics of mirrors with any shape of a reflecting surface in the 0.6-20 nm spectral range. The other, designed especially to study the influence of EUV sources on the reflecting characteristics of the mirrors, allows testing of flat samples. Owing to a high aperture ratio (solid angle of 0.034 steradian), high reflection coefficient of mirrors, powerful windowless X-ray tube, and effective detector, the reflectometer provides a resolution of the reflection coefficient variation at a level of 0.1%.

引用

页码：8 / 15

页数：8

共 11 条

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