Plasma etching carbon nanotube arrays and the field emission properties

被引：65

作者：

Liu, YM

Liu, L

Liu, P

Sheng, LM

Fan, SS ^{[1
]}

机构：

[1] Tsinghua Univ, Dept Phys, Beijing 100084, Peoples R China

[2] Tsinghua Univ, Tsinghua Foxconn Nanotechnol Res Ctr, Beijing 100084, Peoples R China

来源：

基金：

中国国家自然科学基金;

关键词：

carbon nanotube arrays; field emission; plasma etching;

D O I：

10.1016/j.diamond.2004.01.014

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We study the morphologies and the field emission properties of carbon nanotube (CNT) arrays grown on silicon substrate before and after Ar and O-2 plasmas etching. The CNT arrays are synthesized by chemical vapor deposition of ethylene and argon gases in the presence of iron catalysts. Plasma etching is carried out in a DC magnetron-sputtering apparatus. After the treatment, a novel structure of needle-shaped bundles on the surface of CNT arrays is obtained, whose morphologies will be quite different under varied conditions. Enhanced field emission properties are observed after proper treatment. (C) 2004 Elsevier B.V All rights reserved.

引用

页码：1609 / 1613

页数：5

共 17 条

[1] Field emission from carbon nanotubes:: the first five years [J].