Enlargement of the diamond deposition area in combustion flame method by traversing substrate

被引：10
作者：
Ando, Y [1 ]
Tobe, S
Saito, T
Sakurai, JI
Tahara, H
Yoshikawa, T
机构：
[1] Ashikaga Inst Technol, Fac Engn, Ashikaga, Tochigi 3268558, Japan
[2] Osaka Univ, Grad Sch Engn Sci, Toyonaka, Osaka 5608531, Japan
来源：
THIN SOLID FILMS | 2004年 / 457卷 / 01期
关键词：
chemical vapor deposition; diamond; plasma processing and deposition; molybdenum;
D O I：
10.1016/j.tsf.2003.12.042
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this study, diamond deposition on traversing substrate was carried out in order to get useful information for utilizing combustion flame method. In the case of stationary substrate, diamond particles were obtained on the condition that C2H2/O-2 flow ratio was from 1.00 to 1.15, while no particles could be obtained in oxygen rich environment. However, in the case of traversing substrate, dense diamond belt was deposited without oxidizing of the diamond particles due to oxidative flame. From these results, it was proved that large area deposition by substrate traversing was available even in the case of combustion flame CVD. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码：217 / 223
页数：7
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