Origin of X-ray photon stimulated desorption of Cl+ and Cl2+ ions from Cl/Si(111)-(1x1)

被引：10

作者：

Flege, JI

Schmidt, T

Falta, J

Materlik, G

机构：

[1] Elektronen Synchrotron DESY, Hamburger Synchrontronstschlungslab HASYLAB, D-22603 Hamburg, Germany

[2] Univ Bremen, Inst Festkorperphys, D-28334 Bremen, Germany

来源：

SURFACE SCIENCE | 2002年 / 507卷

关键词：

photon stimulated desorption (PSD); X-ray scattering; diffraction; and reflection; X-ray standing waves; surface structure; morphology; roughness; and topography; chlorine; silicon; surface defects;

D O I：

10.1016/S0039-6028(02)01274-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In this paper we investigate minority adsorption sites on Cl/Si(1 1 1)-(1 x 1) with the X-ray standing wave technique. By a combination with X-ray photon stimulated desorption, we show that the coordinates of the desorption-active chlorine minority adsorption site can be determined analytically if standing wave difference spectra are recorded at the chlorine Is absorption edge. Furthermore, the direct and indirect contributions to the total Cl+ and Cl2+ ion desorption yields above the chlorine K edge can be separated and the ratio of the atomic desorption cross-sections call be estimated. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：381 / 388

页数：8

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