Scalable interference lithography alignment for fabrication of three-dimensional photonic crystals

被引：15

作者：

Feigel, A ^{[1
]}

Kotler, Z ^{[1
]}

Sfez, B ^{[1
]}

机构：

[1] Soreq Nucl Res Ctr, Electro Opt Div, IL-81800 Yavne, Israel

来源：

OPTICS LETTERS | 2002年 / 27卷 / 09期

关键词：

D O I：

10.1364/OL.27.000746

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Holographic lithography is an ideal technique for fabricating three-dimensional photonic crystals. However, a critical stage in the fabrication is the minute alignment of the layers with one another. We present a simple moirelike alignment technique with better than 20-nm translation resolution and 45-murad rotation resolution. This technique can easily be extended to other situations when low-cost, high-precision alignment is needed. (C) 2002 Optical Society of America.

引用

页码：746 / 748

页数：3

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