Exploration of thermolithography for micro- and nano-manufacturing

被引:0
作者
Hung, Ming-Tsung [1 ]
Ju, Y. Sungtaek [1 ]
机构
[1] Univ Calif Los Angeles, Dept Mech & Aerosp Engn, Los Angeles, CA 90095 USA
来源
ADVANCES IN ELECTRONIC PACKAGING 2005, PTS A-C | 2005年
关键词
D O I
10.1115/IPACK2005-73424
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Lithography is a critical enabling technology for manufacturing micro- and nano-scale devices and structures. The manuscript presents our recent progress in the exploration of a new lithography technique that employs localized heating to induce thermo-chemical crosslinking of photoresist layers. The thermal transport properties of photoresist layers are measured and kinetics of cross-linking reactions is studied using microfabricated heaters as localized heat sources. It is demonstrated that polymer films can be patterned in a controlled manner using heater temperature, heating duration, as well as UV exposure dose as control variables. The data and experimental approaches presented here will help systematic evaluation and development of-thermolithography schemes.
引用
收藏
页码:1949 / 1954
页数:6
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