Atomic and molecular layer deposition for surface modification

被引:16
作者
Vaha-Nissi, Mika [1 ]
Sievanen, Jenni [1 ]
Salo, Erkki [1 ]
Heikkila, Pirjo [1 ]
Kentta, Eija [1 ]
Johansson, Leena-Sisko [2 ]
Koskinen, Jorma T. [1 ]
Harlin, Ali [1 ]
机构
[1] VTT Tech Res Ctr Finland, FI-02044 Espoo, Finland
[2] Aalto Univ, Sch Chem Technol, Dept Forest Prod Technol, FI-00076 AAlto, Finland
关键词
Adhesion; Atomic layer deposition; Hybrid; Inorganic; Surface treatment; LINEAR CARBOXYLIC-ACIDS; GAS-DIFFUSION BARRIERS; PACKAGING MATERIALS; ALUMINUM-OXIDE; AL2O3; GROWTH; POLYMER; COATINGS; FILMS; PERFORMANCE;
D O I
10.1016/j.jssc.2013.11.040
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
Atomic and molecular layer deposition (ALD and MLD, respectively) techniques are based on repeated cycles of gas-solid surface reactions. A partial monolayer of atoms or molecules is deposited to the surface during a single deposition cycle, enabling tailored film composition in principle down to molecular resolution on ideal surfaces. Typically ALD/MLD has been used for applications where uniform and pinhole free thin film is a necessity even on 3D surfaces. However, thin - even non-uniform - atomic and molecular deposited layers can also be used to tailor the surface characteristics of different non-ideal substrates. For example, print quality of inkjet printing on polymer films and penetration of water into porous nonwovens can be adjusted with low-temperature deposited metal oxide. In addition, adhesion of extrusion coated biopolymer to inorganic oxides can be improved with a hybrid layer based on lactic acid. (C) 2013 Elsevier Inc. All rights reserved.
引用
收藏
页码:7 / 11
页数:5
相关论文
共 33 条
[1]   XPS STUDY OF POLYMER ORGANOMETALLIC INTERACTION - TRIMETHYL ALUMINUM ON POLYVINYL-ALCOHOL POLYMER [J].
AKHTER, S ;
ZHOU, XL ;
WHITE, JM .
APPLIED SURFACE SCIENCE, 1989, 37 (02) :201-216
[2]  
[Anonymous], 1992, HIGH RESOLUTION XPS, DOI DOI 10.1002/ADMA.19930051035
[3]   Ca test of Al2O3 gas diffusion barriers grown by atomic layer deposition on polymers [J].
Carcia, P. F. ;
McLean, R. S. ;
Reilly, M. H. ;
Groner, M. D. ;
George, S. M. .
APPLIED PHYSICS LETTERS, 2006, 89 (03)
[4]   Enhanced OLED performance upon photolithographic patterning by using an atomic-layer-deposited buffer layer [J].
Chang, Chih-Yu ;
Tsai, Feng-Yu ;
Jhuo, Syue-Jhao ;
Chen, Miin-Jang .
ORGANIC ELECTRONICS, 2008, 9 (05) :667-672
[5]   X-ray photoelectron spectroscopy studies of plasma-modified PET surface and alumina/PET interface [J].
Cueff, R ;
Baud, G ;
Benmalek, M ;
Besse, JP ;
Butruille, JR ;
Jacquet, M .
APPLIED SURFACE SCIENCE, 1997, 115 (03) :292-298
[6]   Gas diffusion barriers on polymers using multilayers fabricated by Al2O3 and rapid SiO2 atomic layer deposition [J].
Dameron, Arrelaine A. ;
Davidson, Stephen D. ;
Burton, Beau B. ;
Carcia, Peter F. ;
McLean, R. Scott ;
George, Steven M. .
JOURNAL OF PHYSICAL CHEMISTRY C, 2008, 112 (12) :4573-4580
[7]   Investigation of sub-nm ALD aluminum oxide films by plasma assisted etch-through [J].
Grigoras, K. ;
Franssila, S. ;
Airaksinen, V-M. .
THIN SOLID FILMS, 2008, 516 (16) :5551-5556
[8]  
HIRVIKORPI T, 2011, 770 VTT
[9]   Thin Al2O3 barrier coatings onto temperature-sensitive packaging materials by atomic layer deposition [J].
Hirvikorpi, Terhi ;
Vaha-Nissi, Mika ;
Nikkola, Juha ;
Harlin, Ali ;
Karppinen, Maarit .
SURFACE & COATINGS TECHNOLOGY, 2011, 205 (21-22) :5088-5092
[10]   Effect of corona pre-treatment on the performance of gas barrier layers applied by atomic layer deposition onto polymer-coated paperboard [J].
Hirvikorpi, Terhi ;
Vaha-Nissi, Mika ;
Harlin, Ali ;
Marles, Jaana ;
Miikkulainen, Ville ;
Karppinen, Maarit .
APPLIED SURFACE SCIENCE, 2010, 257 (03) :736-740