Water desorption from magnesium oxide films fabricated by chemical vapor deposition

被引：3

作者：

Kawaguchi, S. ^{[1
]}

Namiki, K. C. ^{[1
]}

Ohshio, S. ^{[1
]}

Nishino, J. ^{[1
]}

Saitoh, H. ^{[1
]}

机构：

[1] Nagaoka Univ Technol, Dept Mat Sci, 1603-1 Kamitomioka, Nagaoka, Niigata 9402188, Japan

来源：

AICAM 2005 | 2006年 / 11-12卷

关键词：

MgO; CVD; TPD; water desorption;

D O I：

10.4028/www.scientific.net/AMR.11-12.693

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Magnesium oxide (MgO) films are utilized for the anti-plasma sputtering coating with excellent ability of secondary electron emission in plasma display panels (PDP). These properties are degraded by the impurities adsorbed on the film surface. Therefore, we should obtain impurity-free surface during the PDP manufacturing process. We have synthesized whisker and continuous film types of metal oxide using a chemical vapor deposition (CVD) method operated under atmosphere. In this study, a temperature programmed desorption method has been applied to detect residual species adsorbed on the surface of the present films in the ultra-high vacuum atmosphere. The amount of water adsorption was determined by this method.

引用

页码：693 / +

页数：2

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