New kinetics model analysis for a short pulse width XeCl* laser and UV preionization influence

被引:2
|
作者
Ren, R [1 ]
Chen, CL
Xu, J
Jing, KX
Zhu, SH
Wang, YC
Yuan, X
Zhao, XG
机构
[1] Xian Jiaotong Univ, Dept Phys, Xian 710049, Peoples R China
[2] Northwestern Polytech Univ, Dept Appl Phys, Xian 710072, Peoples R China
[3] Xian Jiaotong Univ, Inst Biomed Engn, Xian 710049, Peoples R China
[4] Xian Jiaotong Univ, Sch Elect & Informat, Xian 710049, Peoples R China
关键词
D O I
10.1238/Physica.Regular.069a00342
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
A rate calculation and new kinetics model have been applied to a short pulse, high power XeCl laser, in order that the UV preionization design for large volume glow discharge is realized. A laser beam of 450 mJ, 15 ns duration, cross section of 2 x 1.78 cm(2), cavity length of preionization and glow discharge 900 mm. and a beam quality element of 3.5 cm along the discharge direction and 2.1 cm along the y direction has been achieved. It shows that, the laser in the composition of gas mixtures HCl : Xe : He = 0.1 % : 1% :98.9%, 37.5 kV indicates a best pulse profile with more than 5.4% efficiency and a beam divergence angle smaller than 3 mrad. The laser acting on CMR and quartz material makes block materials eject plasma spilling eclosion without burning etching.
引用
收藏
页码:342 / 347
页数:6
相关论文
共 50 条