Gold cleaning methods for electrochemical detection applications

被引：251

作者：

Fischer, Lee M. ^{[1
]}

Tenje, Maria ^{[1
]}

Heiskanen, Arto R. ^{[1
]}

Masuda, Noriyuki ^{[1
]}

Castillo, Jaime ^{[1
]}

Bentien, Anders ^{[2
]}

Emneus, Jenny ^{[1
]}

Jakobsen, Mogens H. ^{[1
]}

Boisen, Anja ^{[1
]}

机构：

[1] Tech Univ Denmark, Dept Micro & Nanotechnol, DTU Nanotech, DK-2800 Lyngby, Denmark

[2] Grundfos AS, DK-8850 Bjerringbro, Denmark

来源：

MICROELECTRONIC ENGINEERING | 2009年 / 86卷 / 4-6期

关键词：

Gold cleaning; Electrochemistry; Cyclic voltammetry; Impedance spectroscopy; SELF-ASSEMBLED MONOLAYER; ULTRAVIOLET OZONE;

D O I：

10.1016/j.mee.2008.11.045

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This work investigates methods for obtaining reliably clean gold film surfaces. Nine gold cleaning methods are investigated here: UV ozone photoreactor; potassium hydroxide-hydrogen peroxide; potassium hydroxide potential sweep; sulfuric acid hydrogen peroxide; sulfuric acid potential cycling; hydrochloric acid potential cycling; dimethylamine borane reducing agent solutions at 25 and 65 degrees C; and a dilute form of Aqua Regia. Peak-current potential-differences obtained from cyclic voltammetry and charge transfer resistance obtained from electrochemical impedance spectroscopy, as well as X-ray photo-electron spectroscopy are used to characterize surface cleanliness. A low peak-current potential-difference and charge transfer resistance indicates a cleaner surface, as does a higher percentage of elemental gold on the electrode surface. The potassium hydroxide potential sweep method is found to leave the gold surface the cleanest overall. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：1282 / 1285

页数：4

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