Optical properties of hot-pressed B4C in the extreme ultraviolet

被引:20
作者
Larruquert, JI [1 ]
Keski-Kuha, RAM [1 ]
机构
[1] NASA, Goddard Space Flight Ctr, Greenbelt, MD 20771 USA
关键词
D O I
10.1364/AO.39.001537
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Hot-pressed B4C is found to have a high normal reflectance in the extreme-UV spectral region above 49 nm. This reflectance is comparable with or higher than chemical-vapor-deposited Sic in the spectral region from 49 to 92 nm. Reflectance measurements as a function of the angle of incidence yielded the optical constants of B4C in the spectral range 49-121.6 nm. (C) 2000 Optical Society of America.
引用
收藏
页码:1537 / 1540
页数:4
相关论文
共 10 条
[1]  
BLUMENSTOCK GM, 1995, P SOC PHOTO-OPT INS, V2515, P558, DOI 10.1117/12.212622
[2]   ION-BEAM-DEPOSITED BORON-CARBIDE COATINGS FOR THE EXTREME-ULTRAVIOLET [J].
BLUMENSTOCK, GM ;
KESKIKUHA, RAM .
APPLIED OPTICS, 1994, 33 (25) :5962-5963
[3]   SIC, A NEW MATERIAL FOR MIRRORS .1. HIGH-POWER LASERS .2. VUV APPLICATIONS [J].
CHOYKE, WJ ;
FARICH, RF ;
HOFFMAN, RA .
APPLIED OPTICS, 1976, 15 (09) :2006-2007
[4]   OPTICAL PROPERTIES OF EVAPORATED IRIDIUM IN VACUUM ULTRAVIOLET FROM 500 A TO 2000 A [J].
HASS, G ;
JACOBUS, GF ;
HUNTER, WR .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1967, 57 (06) :758-&
[5]   LONG-DURATION ORBITAL EFFECTS ON OPTICAL COATING MATERIALS [J].
HERZIG, H ;
TOFT, AR ;
FLEETWOOD, CM .
APPLIED OPTICS, 1993, 32 (10) :1798-1804
[6]   Effects of space exposure on ion-beam-deposited silicon-carbide and boron-carbide coatings [J].
Keski-Kuha, RAM ;
Blumenstock, GM ;
Fleetwood, CM ;
Schmitt, DR .
APPLIED OPTICS, 1998, 37 (34) :8038-8042
[7]   NORMAL INCIDENCE REFLECTANCE OF ION-BEAM DEPOSITED SIC FILMS IN THE EUV [J].
KESKIKUHA, RAM ;
OSANTOWSKI, JF ;
HERZIG, H ;
GUM, JS ;
TOFT, AR .
APPLIED OPTICS, 1988, 27 (14) :2815-2816
[8]   AMORPHOUS-SILICON CARBIDE COATINGS FOR EXTREME ULTRAVIOLET OPTICS [J].
KORTRIGHT, JB ;
WINDT, DL .
APPLIED OPTICS, 1988, 27 (14) :2841-2846
[9]   REFLECTANCE AND OPTICAL-CONSTANTS FOR CER-VIT FROM 250 TO 1050 A [J].
OSANTOWSKI, JF .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1974, 64 (06) :834-838
[10]   EFFECT OF OXYGEN ATOM BOMBARDMENT ON THE REFLECTANCE OF SILICON-CARBIDE MIRRORS IN THE EXTREME ULTRAVIOLET REGION [J].
SEELY, JF ;
HOLLAND, GE ;
HUNTER, WR ;
MCCOY, RP ;
DYMOND, KF ;
CORSON, M .
APPLIED OPTICS, 1993, 32 (10) :1805-1810