Thickness, structural and optical properties of electrodeposited NiO thin films

被引：2
作者：
Perumal, Rajagembu [1 ]
Thanikaikarasan, Sethuramachandran [1 ]
机构：
[1] Saveetha Univ, Saveetha Sch Engn, Dept Sci & Humanities, Div Phys, Chennai 602105, Tamil Nadu, India
来源：
MATERIALS TODAY-PROCEEDINGS | 2020年 / 33卷
关键词：
Band gap; Electrodeposition; NiO; Thin films; X-ray diffraction;
D O I：
10.1016/j.matpr.2020.06.337
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Nickel Oxide received great deal of attention due to its excellent combination of physical and chemical properties which make them interesting for numerous fields like electrochemistry, catalysis, corrosion, spintronics and optoelectronics. Nickel Oxide is an excellent semiconductor considered for several applications. In this work, electrochemical deposition of Nickel Oxide thin films on Tin Oxide substrate. The method of weight difference is used to estimate thickness value of the deposited films. Structural properties showed that the deposited films have polycrystalline nature. Optical properties showed that the prepared films have band gap value around 3.32 eV. (C) 2019 Elsevier Ltd. All rights reserved.
引用
收藏
页码：3989 / 3992
页数：4
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