Grain sizes and surface roughness in platinum and gold thin films

被引：31

作者：

Melo, LL ^{[1
]}

Vaz, AR ^{[1
]}

Salvadori, MC ^{[1
]}

Cattani, M ^{[1
]}

机构：

[1] Univ Sao Paulo, Inst Fis, BR-05315970 Sao Paulo, Brazil

来源：

ISMANAM 2003: METASTABLE, MECHANICALLY ALLOYED AND NANOCRYSTALLINE MATERIALS | 2004年 / 20-21卷

关键词：

gold; grain size; platinum; roughness; thin films;

D O I：

10.4028/www.scientific.net/JMNM.20-21.623

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

We have used silicon and glass as substrate for gold and platinum thin films deposition. The film thickness are between 40 and 440 nm for gold and between 26 and 220 nm for platinum. We have analyzed these samples by scanning tunneling microscopy and by X ray diffraction. The crystallographic and morphological grain sizes are discussed.

引用

页码：623 / 628

页数：6

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