Modular ultrahigh vacuum-compatible gas-injection system with an adjustable gas flow for focused particle beam-induced deposition

A gas-injection system (GIS) heats up a powdery substance and transports the resulting gas through a capillary into a vacuum chamber. Such a system can be used to guide a (metal)organic precursor gas very close to the focal area of an electron or ion beam, where a permanent deposit is created and adheres to the substrate. This process is known as focused particle beam-induced deposition. The authors present design principles and give construction details of a GIS suitable for ultrahigh vacuum usage. The GIS is composed of several self-contained components which can be customized rather independently. It allows for a continuously adjustable gas-flow rate. The GIS was attached to a standard scanning electron microscope (JEOL 6100) and tested with the tungsten precursor W(CO)(6). The analysis of the deposits by means of atomic force microscopy and energy dispersive x-ray spectroscopy provides clear evidence that excellent gas-flow-rate stability and ensuing growth rate and metal-content reproducibility are experienced.