On the relation between damage rate and stress level evolution in α-Cr2O3 thin films growing on Ni-33at%Cr

被引：14

作者：

Siab, R. ^{[2
]}

Huvier, C. ^{[1
]}

Kemdehoundja, M. ^{[1
]}

Grosseau-Poussard, J. L. ^{[1
]}

Dinhut, J. F. ^{[1
]}

机构：

[1] Univ La Rochelle, LEMMA, F-17042 La Rochelle, France

[2] Ctr Univ El Tarf, El Tarf 36000, Algeria

来源：

CORROSION SCIENCE | 2009年 / 51卷 / 09期

关键词：

Oxidation; Effects of strain; Stress relaxation; HIGH-TEMPERATURE OXIDATION; ALUMINA;

D O I：

10.1016/j.corsci.2009.05.032

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The blistering phenomenon has been studied in chromia films formed between 700 and 900 degrees C on Ni33at%Cr. The experimental conditions of the blister occurrence and the damaged surface by blisters and spalls have been determined. From the comparison between the growth stress evolution in the oxide film - which has been related to the oxide microstructure development - and the damage rate the stress relaxation by creep is shown to prevent the formation of blisters and spalls. (C) 2009 Elsevier Ltd. All rights reserved.

引用

收藏

页码：2246 / 2248

页数：3

相关论文

共 14 条

[1] EXSITU AND INSITU DETERMINATION OF STRESS DISTRIBUTIONS IN CHROMIUM-OXIDE FILMS BY RAMAN MICROSCOPY [J].

BIRNIE, J ;

CRAGGS, C ;

GARDINER, DJ ;

GRAVES, PR .

CORROSION SCIENCE, 1992, 33 (01) :1-12

[2] Oxide scale stress determination by Raman spectroscopy application to the NiCr/Cr2O3 system and influence of yttrium [J].

Calvarin, G ;

Huntz, AM ;

Le Goff, AH ;

Joiret, S ;

Bernard, MC .

SCRIPTA MATERIALIA, 1998, 38 (11) :1649-1658

[3] The lateral growth strain accompanying the formation of a thermally grown oxide [J].

Clarke, DR .

ACTA MATERIALIA, 2003, 51 (05) :1393-1407

[4] Creep relaxation and the spallation of oxide layers [J].

Evans, HE ;

Taylor, MP .

SURFACE & COATINGS TECHNOLOGY, 1997, 94-5 (1-3) :27-33

[5]

HUNTZ AM, 2003, OXIDATION MAT METALL

[6] High temperature oxidation of Ni70Cr30 alloy:: Determination of oxidation kinetics and stress evolution in chromia layers by Raman spectroscopy [J].

Kemdehoundja, M. ;

Dinhut, J. F. ;

Grosseau-Poussard, J. L. ;

Jeannin, M. .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2006, 435 :666-671

[7] Substrate grain boundary effect on residual stress distribution at micrometer scale in chromia oxide thin films [J].

Kemdehoundja, M. ;

Grosseau-Poussard, J. L. ;

Dinhut, J. F. .

APPLIED PHYSICS LETTERS, 2008, 92 (24)

[8] Growth stresses in α-Cr2O3 thermal oxide films determined by in situ high temperature Raman spectroscopy [J].

Kemdehoundja, M. ;

Grosseau-Poussard, J. L. ;

Dinhut, J. F. ;

Panicaud, B. .

JOURNAL OF APPLIED PHYSICS, 2007, 102 (09)

[9] High-pressure study of Cr2O3 obtained by high-temperature oxidation by X-ray diffraction and Raman spectroscopy [J].

Mougin, J ;

Le Bihan, T ;

Lucazeau, G .

JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2001, 62 (03) :553-563

[10] ROLE OF OXIDE MICROSTRUCTURE AND GROWTH STRESSES IN HIGH-TEMPERATURE SCALING OF NICKEL [J].

RHINES, FN ;

WOLF, JS .

METALLURGICAL TRANSACTIONS, 1970, 1 (06) :1701-&