Effect of substrate temperature on corrosion performance of nitrogen doped amorphous carbon thin films in NaCl solution

被引:19
作者
Khun, N. W. [1 ]
Liu, E. [1 ]
机构
[1] Nanyang Technol Univ, Sch Mech & Aerosp Engn, Singapore 639798, Singapore
关键词
A-C:N thin film; DC magnetron sputtering; Substrate temperature; Corrosion; Potentiodynamic polarization; DIAMOND; FRACTION; BEHAVIOR; NITRIDE; STRESS; PLASMA; RAMAN; CVD;
D O I
10.1016/j.tsf.2009.03.030
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Nitrogen doped amorphous carbon (a-C:N) thin films were deposited on p-Si substrates by DC magnetron sputtering at varying substrate temperature from room temperature (RT) to 300 degrees C. The bonding structure, surface morphology and adhesion strength of the a-C:N films were investigated by using X-ray photoelectron spectroscopy (XPS), micro-Raman spectroscopy, atomic force microscopy (AFM) and micro-scratch testing. The corrosion behavior of the a-C:N films was evaluated by potentiodynamic polarization test in a 0.6 M NaCl solution. The results indicated that the corrosion resistance of the films depended on the sp(3)-bonded cross-link structure that was significantly affected by the substrate temperature. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:4762 / 4766
页数:5
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