Effect of Substrate Temperature on Structure and Magnetic Properties of Co2FeSi/Si(001) Thin films

被引：1

作者：

Hazra, Binoy Krishna ^{[1
]}

Kumari, T. Prasanna ^{[1
,2
]}

Raja, M. Manivel ^{[2
]}

Kamat, S. V. ^{[2
]}

Srinath, S. ^{[1
]}

机构：

[1] Univ Hyderabad, Sch Phys, Hyderabad 500046, Andhra Pradesh, India

[2] Def Met Res Lab, Hyderabad 500058, Andhra Pradesh, India

来源：

PROCEEDINGS OF THE 59TH DAE SOLID STATE PHYSICS SYMPOSIUM 2014 (SOLID STATE PHYSICS) | 2015年 / 1665卷

关键词：

Heusler alloy; Magnetron Sputtering; XRR; Magnetic properties; CO2FESI;

D O I：

10.1063/1.4918203

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Co2FeSi thin films were grown onto Si(001) by UHV magnetron sputtering at different substrate temperatures (RT, 300, 400, 450, 500 and 550 degrees C) keeping other sputtering conditions same. The films are disordered at low substrate temperatures and may transform into partially ordered B2 and fully ordered L2(1) phases upon increasing substrate temperatures. X-ray reflectivity analysis revealed an increase in surface roughness with increase in substrate temperature. The GIXRD measurements confirmed the reflectivity results. The magnetic properties of the prepared Co2FeSi films are investigated and correlated with the structural properties.

引用

页数：2

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