Ultrashort Pulsed Laser Ablation of Magnesium Diboride: Plasma Characterization and Thin Films Deposition

被引：3

作者：

De Bonis, Angela ^{[1
]}

Galasso, Agostino ^{[1
]}

Santagata, Antonio ^{[2
]}

Teghil, Roberto ^{[1
]}

机构：

[1] Univ Basilicata, Dipartimento Sci, I-85100 Potenza, Italy

[2] CNR UOS Tito Scalo, Ist Struttura Mat, I-85050 Tito, Italy

来源：

JOURNAL OF NANOMATERIALS | 2015年 / 2015卷

关键词：

MGB2; GROWTH; TEMPERATURE;

D O I：

10.1155/2015/596328

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A MgB2 target has been ablated by Nd: glass laser with a pulse duration of 250 fs. The plasma produced by the laser-target interaction, showing two temporal separated emissions, has been characterized by time and space resolved optical emission spectroscopy and ICCD fast imaging. The films, deposited on silicon substrates and formed by the coalescence of particles with nanometric size, have been analyzed by scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy, micro-Raman spectroscopy, and X-ray diffraction. The first steps of the films growth have been studied by Transmission Electron Microscopy. The films deposition has been studied by varying the substrate temperature from 25 to 500 degrees C and the best results have been obtained at room temperature.

引用

页数：9

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