Measurements of spatial distributions of electron density and temperature of 450 MHz UHF plasma using laser Thomson scattering

被引：0

作者：

Pan, Yiming ^{[1
]}

Tomita, Kentaro ^{[1
]}

Kawai, Yoshinobu ^{[1
]}

Matsukuma, Masaaki ^{[2
]}

Uchino, Kiichiro ^{[1
]}

机构：

[1] Kyushu Univ, Interdisciplinary Grad Sch Engn Sci, Fukuoka 8168580, Japan

[2] Tokyo Electron Technol Solut Ltd, Nirasaki, Yamanashi 4078511, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2021年 / 60卷 / SA期

关键词：

capacitively coupled plasma; UHF plasma; Laser Thomson scattering; plasma uniformity (center-peaked profile); CAPACITIVELY COUPLED PLASMA; LARGE-AREA; STANDING-WAVE; 2-DIMENSIONAL STRUCTURE; FREQUENCY; DISCHARGES; NONUNIFORMITIES; DIAGNOSTICS; UNIFORMITY; ASYMMETRY;

D O I：

暂无

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A capacitively coupled Ar plasma was produced by the ultra-high frequency power source (450 MHz) and the plasma parameters were studied by laser Thomson scattering. It was found that a very high density plasma with a low electron temperature was realized; the electron densityn(e)is around (1.1-1.5) x 10(18)m(-3)and the electron temperatureT(e)is around (1.7-2.1) eV. Radial profiles ofn(e)andT(e)were obtained for different pressures and powers. In all the conditions explored,n(e)had a single-center-peak profile, whileT(e)profiles were relatively flat along the electrode.

引用

页数：7

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