Picosecond time-resolved X-ray diffraction of a photoexcited silicon crystal

被引：1

作者：

Yazaki, A ^{[1
]}

Kishimura, H ^{[1
]}

Kawano, H ^{[1
]}

Hironaka, Y ^{[1
]}

Nakamura, KG ^{[1
]}

Kondo, K ^{[1
]}

机构：

[1] Tokyo Inst Technol, Mat & Struct Lab, Midori Ku, Yokohama, Kanagawa 2268503, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2002年 / 41卷 / 3A期

关键词：

time-resolved X-ray diffraction; laser plasma X-rays; acoustic phonon; femtosecond laser; silicon;

D O I：

10.1143/JJAP.41.1614

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Direct observation of the lattice dynamics of a photoexcited silicon crystal is performed by means of picosecond time-resolved X-ray diffraction. X-ray diffraction profiles from 300 ps laser-irradiated Si(I 11) are obtained at a time step of 50 ps. The results are in quantitative agreement with results of simulations based on dynamical diffraction theory, and are consistent with an interpretation based on acoustic wave propagation.

引用

页码：1614 / 1615

页数：2

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