A Compact Dual-wavelength Optical Head for Photo-lithography

被引：0

作者：

Lee, Yuan-Chin ^{[1
,2
]}

Chao, Shiuh ^{[2
]}

Huang, Chun-Chieh ^{[1
]}

Chen, Shuen-Chen ^{[1
]}

Cheng, Chung-Ta ^{[1
]}

机构：

[1] Ind Technol Res Inst, Elect & Optoelect Res Labs, Hsinchu, Taiwan

[2] Natl Tsing Hua Univ, Inst Photon Technol, Hsinchu, Taiwan

来源：

2013 CONFERENCE ON LASERS AND ELECTRO-OPTICS PACIFIC RIM (CLEO-PR) | 2013年

关键词：

INORGANIC PHOTORESIST; FABRICATION;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A dual-wavelength optical head with an NA0.85 objective lens for lithography was developed. Both 405nm and 650nm are integrated in this optical head. It can be used to expose both organic and in-organic photo-resists and meanwhile performing focusing servo.

引用

页数：2