Tunable Bragg reflectors on silicon-on-insulator rib waveguides

被引：56

作者：

Giuntoni, Ivano ^{[1
]}

Gajda, Andrzej ^{[1
]}

Krause, Michael ^{[2
]}

Steingrueber, Ralf ^{[3
]}

Bruns, Juergen ^{[1
]}

Petermann, Klaus ^{[1
]}

机构：

[1] Tech Univ Berlin, Fachgebiet Hochfrequenztech, D-10587 Berlin, Germany

[2] Tech Univ Hamburg, D-21073 Hamburg, Germany

[3] Heinrich Hertz Inst Nachrichtentech Berlin GmbH, Fraunhofer Inst Nachrichtentech, D-10587 Berlin, Germany

来源：

OPTICS EXPRESS | 2009年 / 17卷 / 21期

关键词：

GRATINGS; FABRICATION;

D O I：

10.1364/OE.17.018518

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present the design, fabrication and characterization of Bragg reflectors on silicon-on-insulator rib waveguides. The fabrication is based on a new double lithographic process, combining electron-beam lithography for the grating and photolithography for the waveguides. This process allows the realization of low loss reflectors, which were fully characterized. The influence of the etching depth and of the waveguide geometry on the reflector performance is considered. We demonstrate a reflectivity larger than 80% over a bandwidth of 0.8 nm with an insertion loss of only 0.5 dB. A thermal tunability of the device is also considered, showing that a shift of the reflected wavelength of 77 pm/K is possible. (c) 2009 Optical Society of America

引用

页码：18518 / 18524

页数：7

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