Electromigration induced Kirkendall void growth in Sn-3.5Ag/Cu solder joints

被引:28
作者
Jung, Yong [1 ]
Yu, Jin [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Elect Packaging Lab, Dept Mat Sci & Engn, Taejon 305701, South Korea
基金
新加坡国家研究基金会;
关键词
INTERMETALLIC GROWTH; DIFFUSION; MANIFESTATIONS; KINETICS; STRESS;
D O I
10.1063/1.4867115
中图分类号
O59 [应用物理学];
学科分类号
摘要
Effects of electric current flow on the Kirkendall void formation at solder joints were investigated using Sn-3.5Ag/Cu joints specially designed to have localized nucleation of Kirkendall voids at the Cu3Sn/Cu interface. Under the current density of 1 x 10(4) A/cm(2), kinetics of Kirkendall void growth and intermetallic compound thickening were affected by the electromigration (EM), and both showed the polarity effect. Cu6Sn5 showed a strong susceptibility to the polarity effect, while Cu3Sn did not. The electromigration force induced additional tensile (or compressive) stress at the cathode (or anode), which accelerated (or decelerated) the void growth. From the measurements of the fraction of void at the Cu3Sn/Cu interface on SEM micrographs and analysis of the kinetics of void growth, the magnitude of the local stress induced by EM was estimated to be 9 MPa at the anode and -7 MPa at the cathode. (C) 2014 AIP Publishing LLC.
引用
收藏
页数:9
相关论文
共 37 条
[1]  
[Anonymous], P APEX C EL MAN AN C
[2]  
Ashby M.F., 1982, DEFORMATION MECH MAP
[3]   STRESS GENERATION BY ELECTROMIGRATION [J].
BLECH, IA ;
HERRING, C .
APPLIED PHYSICS LETTERS, 1976, 29 (03) :131-133
[4]  
Budiansky B., 1982, MECH SOLIDS+, P13
[5]   Electromigration enhanced intermetallic growth and void formation in Pb-free solder joints [J].
Chao, Brook ;
Chae, Seung-Hyun ;
Zhang, Xuefeng ;
Lu, Kuan-Hsun ;
Ding, Min ;
Im, Jay ;
Ho, Paul S. .
JOURNAL OF APPLIED PHYSICS, 2006, 100 (08)
[6]   Investigation of diffusion and electromigration parameters for Cu-Sn intermetallic compounds in Pb-free solders using simulated annealing [J].
Chao, Brook ;
Chae, Seung-Hyun ;
Zhang, Xuefeng ;
Lu, Kuan-Hsun ;
Im, Jay ;
Ho, P. S. .
ACTA MATERIALIA, 2007, 55 (08) :2805-2814
[7]   Recent advances on kinetic analysis of electromigration enhanced intermetallic growth and damage formation in Pb-free solder joints [J].
Chao, Brook Huang-Lin ;
Zhang, Xuefeng ;
Chae, Seung-Hyun ;
Ho, Paul S. .
MICROELECTRONICS RELIABILITY, 2009, 49 (03) :253-263
[8]   Electromigration and Thermomigration in Pb-Free Flip-Chip Solder Joints [J].
Chen, Chih ;
Tong, H. M. ;
Tu, K. N. .
ANNUAL REVIEW OF MATERIALS RESEARCH, VOL 40, 2010, 40 :531-555
[9]   Polarity effect of electromigration on kinetics of intermetallic compound formation in Pb-free solder V-groove samples [J].
Gan, H ;
Tu, KN .
JOURNAL OF APPLIED PHYSICS, 2005, 97 (06)
[10]  
Glickman M. E., 2000, DIFFUSION SOLIDS FIE