GISAXS study of Cu-Ni alloy clusters obtained by double ion implantation in silicate glasses

被引：24

作者：

Cattaruzza, E

d'Acapito, F

Gonella, F

Longo, A

Martorana, A

Mattei, G

Maurizio, C

Thiaudière, D

机构：

[1] Univ Venice, Dipartimento Chim Fis, INFM, I-30123 Venice, Italy

[2] CRG, GILDA, European Synchrotron Radiat Facil, INFM, F-38043 Grenoble, France

[3] Univ Padua, Dipartimento Fis, INFM, I-35131 Padua, Italy

[4] Univ Palermo, Dipartimento Chim Inorgan, I-90100 Palermo, Italy

来源：

JOURNAL OF APPLIED CRYSTALLOGRAPHY | 2000年 / 33卷 / 01期

关键词：

D O I：

10.1107/S0021889800099878

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Sequential double ion implantation in silicate glasses has been used to realize copper-nickel alloy nanoclusters embedded in the host dielectric matrix. A grazing incidence small-angle X-ray scattering experiment has been performed on copper+nickel implanted silicate glasses, to obtain information on the cluster size and size distribution, as well as on the volume fraction. The potential of the technique in the study of these composite glasses is discussed.

引用

页码：740 / 743

页数：4

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