Influence of the geometrical configuration on the plasma ionization distribution and erosion profile of a rotating cylindrical magnetron: a Monte Carlo simulation

被引:20
作者
Musschoot, J.
Depla, D.
Buyle, G.
Haemers, J.
De Gryse, R.
机构
[1] Univ Ghent, Dept Solid State Sci, B-9000 Ghent, Belgium
[2] Centexbel, B-9052 Zwijnaarde, Belgium
关键词
D O I
10.1088/0022-3727/39/18/010
中图分类号
O59 [应用物理学];
学科分类号
摘要
The ionization distribution of a small scale rotating cylindrical magnetron discharge is simulated by a Monte Carlo based program. The simulation describes the high energy electron trajectories and the interaction between these electrons and the sputtering gas, which finally leads to the ionization distribution. By radial projection of the ionization positions on the target surface, the erosion track dimensions can be correctly simulated. The discrepancy between the simulation and the experiments shows the need to modify the experimental design and to control the alignment between the central axis of the target tube and the magnet configuration in a better way.
引用
收藏
页码:3989 / 3993
页数:5
相关论文
共 17 条
  • [1] THEORETICAL ASPECTS OF PERPENDICULAR MAGNETIC RECORDING MEDIA
    ANDRA, W
    DANAN, H
    MATTHEIS, R
    [J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1991, 125 (01): : 9 - 55
  • [2] BOGAERTS A, 1996, THESIS U ANTWERPEN
  • [3] RELATIVISTIC ELECTRON-BEAM-PRODUCED PLASMAS .1. COLLISION CROSS-SECTIONS AND LOSS FUNCTION IN ARGON
    BRETAGNE, J
    CALLEDE, G
    LEGENTIL, M
    PUECH, V
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1986, 19 (05) : 761 - 777
  • [4] Simplified model for the DC planar magnetron discharge
    Buyle, G
    Depla, D
    Eufinger, K
    Haemers, J
    De Bosscher, W
    De Gryse, R
    [J]. VACUUM, 2004, 74 (3-4) : 353 - 358
  • [5] Recapture of secondary electrons by the target in a DC planar magnetron discharge
    Buyle, G
    De Bosscher, W
    Dopla, D
    Eufinger, K
    Haemers, J
    De Gryse, R
    [J]. VACUUM, 2003, 70 (01) : 29 - 35
  • [6] DEBOSSCHER W, 1999, PP 42 ANN TECHN C SO, P156
  • [7] Hysteresis behavior during reactive magnetron sputtering of A2O3 using a rotating cylindrical magnetron
    Depla, D.
    Haemers, J.
    Buyle, G.
    De Gryse, R.
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (04): : 934 - 938
  • [8] Computer-aided simulation of a rotary sputtering magnetron
    Fan, QH
    Gracio, JJ
    Zhou, LQ
    [J]. JOURNAL OF APPLIED PHYSICS, 2004, 95 (11) : 6017 - 6020
  • [9] A cross-corner effect in a rectangular sputtering magnetron
    Fan, QH
    Zhou, LQ
    Gracio, JJ
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2003, 36 (03) : 244 - 251
  • [10] GEISLER M, 1999, P 47 ANN TECHN C SOC, P231