A measurement of elastic moduli for tungsten films on polymer substrate using wrinkling analysis

被引:10
|
作者
Moon, Myoung-Woon [2 ]
Han, Jun Hyun [1 ]
机构
[1] Korea Inst Sci & Technol, Mat Sci & Technol Res Div, Seoul 130650, South Korea
[2] Korea Inst Sci & Technol, Future Fus Technol Lab, Seoul 130650, South Korea
关键词
Wrinkling; Tungsten; Microstructure; DC magnetron sputtering; BUCKLING-BASED METROLOGY; COMPRESSED THIN-FILMS; FOCUSED ION-BEAM; RESIDUAL-STRESS; MICROSTRUCTURE; ADHESION; PATTERNS;
D O I
10.1016/j.apsusc.2009.04.186
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The elastic moduli of ultra thin tungsten (W) films on polymers were assessed with wrinkling analysis. Thin W films with a range of thickness between 17 and 100 nm were deposited on compliant polymers and Si strips using DC magnetron sputtering method, causing the tensile stress in a few GPa scale with respect to the thickness of W films. By applying lateral compression on polymer, wrinkle patterns were developed in the W thin film with well-defined amplitude and wavelength. Using a simple equation on wrinkle analysis, the range of elastic moduli was estimated with increasing the thickness. It was found that the elastic modulus and the tensile stress decreased with increasing the film thickness. (c) 2009 Published by Elsevier B.V.
引用
收藏
页码:593 / 596
页数:4
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