In Situ Construction of a Cs2SnI6 Perovskite Nanocrystal/SnS2 Nanosheet Heterojunction with Boosted Interfacial Charge Transfer

被引:388
作者
Wang, Xu-Dong [1 ]
Huang, Yu-Hua [1 ]
Liao, Jin-Feng [1 ]
Jiang, Yong [1 ]
Zhou, Lei [1 ]
Zhang, Xiao-Yan [1 ]
Chen, Hong-Yan [1 ]
Kuang, Dai-Bin [1 ]
机构
[1] Sun Yat Sen Univ, Sch Chem, Lehn Inst Funct Mat, MOE Key Lab Bioinorgan & Synthet Chem, Guangzhou 510275, Guangdong, Peoples R China
基金
中国国家自然科学基金;
关键词
HALIDE PEROVSKITE; CO2; RECOMBINATION; COMPOSITE; HEMATITE; ELECTRON; SNS2;
D O I
10.1021/jacs.9b04482
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Heterojunction engineering has played an indispensable role in the exploitation of innovative artificial materials with exceptional properties and has consequently triggered a new revolution in achieving high-performance optoelectronic devices. Herein, an intriguing halide perovskite (PVK) and metal dichalcogenide (MD) heterojunction, i.e., a lead-free Cs2SnI6 perovskite nanocrystal/SnS2 nanosheet hybrid, was fabricated in situ for the first time. Comprehensive investigations with experimental characterizations and theoretical calculations demonstrate that cosharing of the Sn atom enables intimate contact in the Cs2SnI6/SnS2 hybrid together with a type II band alignment structure. Additionally, ultrafast carrier separation between SnS2 and Cs2SnI6 has been observed in the Cs2SnI6/SnS2 hybrid by transient absorption measurements, which efficiently prolongs the lifetime of the photogenerated electrons in SnS2 (from 1290 to 3080 ps). The resultant spatial charge separation in the Cs2SnI6/SnS2 hybrid evidenced by Kelvin probe force microscopy (KPFM) significantly boosts the photocatalytic activity toward CO2 reduction and the photoelectrochemical performance, with 5.4-fold and 10.6-fold enhancements compared with unadorned SnS2. This work provides a facile and effective method for the in situ preparation of PVK-MD heterojunctions, which may significantly stimulate the synthesis of various perovskite-based hybrid materials and their further optoelectronic applications.
引用
收藏
页码:13434 / 13441
页数:8
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