Atomic-scale mapping of quantum dots formed by droplet epitaxy

被引:0
作者
Kumah, Divine P. [1 ]
Shusterman, Sergey [2 ]
Paltiel, Yossi [3 ,4 ]
Yacoby, Yizhak [5 ]
Clarke, Roy [1 ]
机构
[1] Univ Michigan, Appl Phys Program, Ann Arbor, MI 48109 USA
[2] Soreq NRC, Electroopt Div, IL-81800 Yavne, Israel
[3] Hebrew Univ Jerusalem, Dept Appl Phys, IL-91904 Jerusalem, Israel
[4] Hebrew Univ Jerusalem, Ctr Nanosci & Nanotechnol, IL-91904 Jerusalem, Israel
[5] Hebrew Univ Jerusalem, Racah Inst Phys, IL-91904 Jerusalem, Israel
基金
美国国家科学基金会;
关键词
GROWTH; SYSTEMS;
D O I
10.1038/NNANO.2009.271
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Quantum dots (QDs) have applications in optoelectronic devices(1,2), quantum information processing(3,4) and energy harvesting(5,6). Although the droplet epitaxy fabrication method(7-9) allows for a wide range of material combinations to be used, little is known about the growth mechanisms involved(10,11). Here we apply direct X-ray methods(12-14) to derive sub-angstrom resolution maps of QDs crystallized from indium droplets exposed to antimony, as well as their interface with a GaAs (100) substrate. We find that the QDs form coherently(15) and extend a few unit cells below the substrate surface. This facilitates a droplet-substrate exchange of atoms, resulting in core-shell structures that contain a surprisingly small amount of In. The work provides the first atomic-scale mapping of the interface between epitaxial QDs and a substrate, and establishes the usefulness of X-ray phasing techniques for this and similar systems.
引用
收藏
页码:835 / 838
页数:4
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