Modification of glassy carbon surfaces by atmospheric pressure cold plasma torch

被引:19
|
作者
Mortensen, Henrik
Kusano, Yukihiro
Leipold, Frank
Rozlosnik, Noemi
Kingshott, Peter
Goutianos, Stergios
Sorensen, Bent F.
Stenum, Bjarne
Bindslev, Henrik
机构
[1] Riso Natl Lab, Opt & Plasma Res Dept, DK-4000 Roskilde, Denmark
[2] Riso Natl Lab, Danish Polymer Ctr, DK-4000 Roskilde, Denmark
[3] Riso Natl Lab, Dept Mat Res, DK-4000 Roskilde, Denmark
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2006年 / 45卷 / 10B期
关键词
glassy carbon; atmospheric pressure; plasma; adhesion; etching; surface treatment; optical emission spectroscopy; ammonia; helium; dielectric barrier discharge;
D O I
10.1143/JJAP.45.8506
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effect of plasma treatment on glassy carbon (GC) surfaces was studied with adhesion improvement in mind. A newly constructed remote plasma source was used to treat GC plates. Pure He and a dilute NH3/He mixture were used as feed gases. Optical emission spectroscopy was performed for plasma torch diagnostics. The treatment resulted in surface etching, substantially enhanced by NH3, as well as a roughening of the surface as measured by atomic force microscopy. Furthermore, the treated area showed an increased wettability indicating the addition of polar functional groups to the surface. X-ray photoelectron spectroscopy confirmed the introduction of several oxygen and nitrogen containing surface functional groups. The adhesion to epoxy was dramatically improved after exposure to either plasma, the effect being largest when NH3 was present in the feed gas.
引用
收藏
页码:8506 / 8511
页数:6
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