Narrowband multilayer coatings for the extreme ultraviolet range of 50-92 nm

被引：19

作者：

Vidal-Dasilva, Manuela ^{[1
]}

Fernandez-Perea, Monica ^{[1
]}

Mendez, Jose A. ^{[1
]}

Aznarez, Jose A. ^{[1
]}

Larruquert, Juan I. ^{[1
]}

机构：

[1] CSIC, Inst Fis Aplicada, GOLD, Madrid 28006, Spain

来源：

OPTICS EXPRESS | 2009年 / 17卷 / 25期

关键词：

SUB-QUARTERWAVE MULTILAYERS; OPTICAL-CONSTANTS; HIGH REFLECTANCE; SCANDIUM FILMS; SPECTRAL RANGE; REFLECTIVITY; REFLECTOMETER; INTERVAL; TERBIUM;

D O I：

10.1364/OE.17.022773

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

A new type of multilayer coatings with narrowband reflection properties and peaked in the similar to 50-92 nm spectral range has been developed. Multilayers are based on Yb, Al, and SiO films and they have been prepared by thermal evaporation. Efficient multilayers based on Yb and Al, with an SiO protective layer were prepared, but they developed a dendrite structure, which was attributed to the reactivity between Al and Yb. Multilayers based on Yb and Al, with both SiO protective and barrier layers, resulted in efficient reflective filters, with no observable dendrite growth. The peak reflectance of aged multilayers was of the order of similar to 0.20, with bandwidths in the range of 12 to 22 nm FWHM. (C) 2009 Optical Society of America

引用

页码：22773 / 22784

页数：12

共 13 条

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Vidal-Dasilva, M.
Fernandez-Perea, M.
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Mendez, J. A.
Aznarez, J. A.
ADVANCES IN X-RAY/EUV OPTICS AND COMPONENTS IV, 2009, 7448
[2] Multilayer coatings for the far and extreme ultraviolet
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Vidal-Dasilva, Manuela
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Mendez, Jose A.
EUV AND X-RAY OPTICS: SYNERGY BETWEEN LABORATORY AND SPACE II, 2011, 8076
[3] Multilayer coatings for optics in the extreme ultraviolet
Larruquert, Juan I.
Vidal-Dasilva, Manuela
Garcia-Cortes, Sergio
Rodriguez-de Marcos, Luis
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Aznarez, Jose A.
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SEVENTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS, 2011, 7995
[4] Tri-material multilayer coatings with high reflectivity and wide bandwidth for 25 to 50 nm extreme ultraviolet light
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OPTICS EXPRESS, 2009, 17 (24): : 22102 - 22107
[5] Narrowband coatings for the 100-105 nm range
Rodriguez-de Marcos, Luis
Mendez, Jose A.
Vidal-Dasilva, Manuela
Aznarez, Jose A.
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DAMAGE TO VUV, EUV, AND X-RAY OPTICS IV; AND EUV AND X-RAY OPTICS: SYNERGY BETWEEN LABORATORY AND SPACE III, 2013, 8777
[6] Multilayer optics for an extreme ultraviolet lithography tool with 70 nm resolution
Soufli, R
Spiller, E
Schmidt, MA
Davidson, JC
Grabner, RF
Gullikson, EM
Kaufmann, BB
Mrowka, S
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Chapman, HN
Hudyma, RM
Taylor, JS
Walton, CC
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Folta, JA
EMERGING LITHOGRAPHIC TECHNOLOGIES V, 2001, 4343 : 51 - 59
[7] Wavelength selection for multilayer coatings for lithography generation beyond extreme ultraviolet
Makhotkin, Igor A.
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JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (04):
[8] Stability of extreme ultraviolet multilayer coatings to low energy proton bombardment
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Corso, Alain Jody
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OPTICS EXPRESS, 2011, 19 (16): : 14838 - 14844
[9] Narrowband filters and broadband mirrors for the spectral range from 50 to 200 nm
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[10] Transmittance and reflective coatings for the 50-200 nm spectral range
Fernandez-Perea, Monica
Larruquert, Juan I.
Aznarez, Jose A.
Mendez, Jose A.
ADVANCES IN X-RAY/EUV OPTICS, COMPONENTS, AND APPLICATIONS, 2006, 6317

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