Numerical analysis of impact of stress in passivation films on electrical properties in AlGaN/GaN heterostructures

被引:10
作者
Shigekawa, Naoteru [1 ]
Sugitani, Suehiro [1 ]
机构
[1] NTT Corp, NTT Photon Labs, Kanagawa 2430198, Japan
来源
IEICE ELECTRONICS EXPRESS | 2009年 / 6卷 / 14期
关键词
GaN; HEMTs; threshold voltage; edge force; piezoelectric effects; passivation film; GA;
D O I
10.1587/elex.6.1045
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The impact of forces due to the difference in mechanical stresses between the Schottky contacts and passivation films on the electrical properties of (0001) AlGaN/GaN Schottky diodes is numerically analyzed in the framework of the edge force model. The compressive (tensile) passivation films induce negative (positive) piezoelectric charges below the Schottky contacts in the GaN channels and bring forth onsets of the concentration of two-dimensional electron gas at shallower (deeper) bias voltages. The change in the bias voltages at the onset due to edge forces of +/- 0.5 GPa . mu m is 1 or 2V for diodes with 0.5-mu m Schottky contacts. This indicates that passivation films with the designed stress play a crucial role in controlling the threshold voltages of AlGaN/GaN HEMTs.
引用
收藏
页码:1045 / 1050
页数:6
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