Surface-discharge characteristics of MgO-thin films prepared by reactive RF unbalanced magnetron sputtering

被引：33

作者：

Park, CH ^{[1
]}

Kim, YK ^{[1
]}

Lee, SH ^{[1
]}

Lee, WG ^{[1
]}

Sung, YM ^{[1
]}

机构：

[1] Pusan Natl Univ, Coll Engn, Dept Elect Engn, Keum Jeong Ku, Pusan 609735, South Korea

来源：

THIN SOLID FILMS | 2000年 / 366卷 / 1-2期

关键词：

a.c. plasma display panels; MgO-thin films; unbalanced magnetron sputtering; bias voltage;

D O I：

10.1016/S0040-6090(00)00718-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The performance of a.c. plasma display panels (PDP) is influenced strongly by the surface glow-discharge characteristics on the MgO-thin films. This paper deals with the surface glow-discharge characteristics and some physical properties of MgO-thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with a.c. PDP. The samples prepared with the d.c. bias voltage of -10 V showed lower discharge voltage, lower erosion rate by ion bombardment, higher optical transparency and higher crack resistance in the annealing process than those samples prepared by conventional magnetron sputtering or E-beam evaporation. (C) 2000 Elsevier Science S.A. All rights reserved.

引用

页码：88 / 94

页数：7

共 18 条

[1] INFLUENCE OF SECONDARY-ELECTRON EMISSION FROM MGO SURFACES ON VOLTAGE-BREAKDOWN CURVES IN PENNING MIXTURES FOR INSULATED-ELECTRODE DISCHARGES [J].