Systematic study of Si-based GeSn photodiodes with 2.6 μm detector cutoff for short-wave infrared detection

被引:121
作者
Thach Pham [1 ]
Du, Wei [1 ]
Huong Tran [1 ]
Margetis, Joe [2 ]
Tolle, John [2 ]
Sun, Greg [3 ]
Soref, Richard A. [3 ]
Naseem, Hameed A. [1 ]
Li, Baohua [4 ]
Yu, Shui-Qing [1 ]
机构
[1] Univ Arkansas, Dept Elect Engn, Fayetteville, AR 72701 USA
[2] ASM, Phoenix, AZ 85034 USA
[3] Univ Massachusetts, Dept Engn, Boston, MA 02125 USA
[4] Arktonics LLC, Fayetteville, AR 72701 USA
基金
美国国家科学基金会;
关键词
PHOTODETECTORS; SILICON;
D O I
10.1364/OE.24.004519
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Normal-incidence Ge1-xSnx photodiode detectors with Sn compositions of 7 and 10% have been demonstrated. Such detectors were based on Ge/Ge1-xSnx/Ge double heterostructures grown directly on a Si substrate via a chemical vapor deposition system. A temperature-dependence study of these detectors was conducted using both electrical and optical characterizations from 300 to 77 K. Spectral response up to 2.6 mu m was achieved for a 10% Sn device at room temperature. The peak responsivity and specific detectivity (D*) were measured to be 0.3 A/W and 4 x 109 cmHz(1/2)W(-1) at 1.55 mu m, respectively. The spectral D* of a 7% Sn device at 77 K was only one order-of-magnitude lower than that of an extended-InGaAs photodiode operating in the same wavelength range, indicating the promising future of GeSn-based photodetectors. (C) 2016 Optical Society of America
引用
收藏
页码:4519 / 4531
页数:13
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