Fabrication of Three-Dimensional Photonic Crystals Using Multibeam Interference Lithography and Electrodeposition

被引：86

作者：

Miyake, Masao ^{[1
]}

Chen, Ying-Chieh ^{[1
]}

Braun, Paul V. ^{[1
]}

Wiltzius, Pierre ^{[1
]}

机构：

[1] Univ Illinois, Dept Mat Sci & Engn, Beckman Inst Adv Sci & Technol, Urbana, IL 61801 USA

来源：

ADVANCED MATERIALS | 2009年 / 21卷 / 29期

基金：

日本学术振兴会;

关键词：

SPONTANEOUS-EMISSION; BANDGAP MATERIALS; TEMPLATES; THICKNESS; SEMICONDUCTORS; INVERSION;

D O I：

10.1002/adma.200802085

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

High-quality 3D photonic crystals are fabricated through electrode position into a polymer template created by multibeam interference lithography. Complete infilling of the template is achieved through electrodeposition of Cu2O, and subsequent etching of the template results in a Cu2O/air photonic crystal with the exact inverse structure of the template (see figure). The resultant photonic crystal shows a high peak reflectance at the theoretically predicted wavelength.

引用

页码：3012 / +

页数：5

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