Triplex molecular layers with nonlinear nanomechanical response

被引:16
作者
Tsukruk, VV [1 ]
Ahn, HS
Kim, D
Sidorenko, A
机构
[1] Iowa State Univ Sci & Technol, Dept Mat Sci & Engn, Ames, IA 50011 USA
[2] Korea Inst Sci & Technol, Tribiol Res Ctr, Seoul 136791, South Korea
关键词
D O I
10.1063/1.1486267
中图分类号
O59 [应用物理学];
学科分类号
摘要
The molecular design of surface structures with built-in mechanisms for mechanical energy dissipation under nanomechanical deformation and compression resistance provided superior nanoscale wear stability. We designed robust, well-defined trilayer surface nanostructures chemically grafted to a silicon oxide surface with an effective composite modulus of about 1 GPa. The total thickness was within 20-30 nm and included an 8 nm rubber layer sandwiched between two hard layers. The rubber layer provides an effective mechanism for energy dissipation, facilitated by nonlinear, giant, reversible elastic deformations of the rubber matrix, restoring the initial status due to the presence of an effective nanodomain network and chemical grafting within the rubber matrix. (C) 2002 American Institute of Physics.
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页码:4825 / 4827
页数:3
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