3D patterning by means of nanoimprinting, X-ray and two-photon lithography

被引：66

作者：

Tormen, M

Businaro, L

Altissimo, M

Romanato, F

Cabrini, S

Perennes, F

Proietti, R

Sun, HB

Kawata, S

Di Fabrizio, E

机构：

[1] LILIT NNL, Natl Nanotechnol Lab, Nanolithog Beamline Elettra Synchrotron Light Sou, INFM,TASC, I-34012 Trieste, Italy

[2] Osaka Univ, Japan Sci & Technol Corp, Dept Appl Phys, PRESTO, Suita, Osaka 5650871, Japan

[3] RIKEN, Inst Phys & Chem Res, Wako, Saitama 3510198, Japan

来源：

MICROELECTRONIC ENGINEERING | 2004年 / 73-4卷

关键词：

nanoimprint lithography; X-ray lithography; two photon lithography; 3D microstructures and nanostructures;

D O I：

10.1016/j.mee.2004.02.081

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Two lithographic techniques suitable for fabricating complex 3D structures with high spatial resolution are presented and discussed. The first one is based on the combined use of nanoimprint and X-ray lithography. Its technological potential has been demonstrated by patterning several types of structures with X-ray lithography on hexagonal array of hemispheres obtained previously by nanoimprinting. These consecutive steps give rise to an intersection-structure where the overall profile of high aspect ratio structures is enveloped by the original 3D imprinted profile. The second technique, two-photon lithography, is an intrinsic 3D lithography and has the highest potential for structuring 3D in the widest sense. The principle of this technology and experimental results in the field of nanomechanics and photonics will be presented. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：535 / 541

页数：7

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