Composite SiO2/TiO2 and amine polymer/TiO2 nanoparticles produced using plasma-enhanced chemical vapor deposition

被引:28
|
作者
Shearer, Jeffrey C. [1 ]
Fisher, Mary J. [1 ]
Hoogeland, D. [2 ]
Fisher, Ellen R. [1 ]
机构
[1] Colorado State Univ, Dept Chem, Ft Collins, CO 80523 USA
[2] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
基金
美国国家科学基金会;
关键词
Plasma deposition; Composite nanomaterials; Titanium dioxide; Surface modification; Nanoparticles; CONTINUOUS-WAVE; THIN-FILMS; TIO2; NANOPARTICLES; PARTICLES; XPS; TEMPERATURE; FABRICATION; MECHANISMS; SIO2-FILMS; LASER;
D O I
10.1016/j.apsusc.2009.09.052
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Plasma-enhanced chemical vapor deposition was used to conformally coat commercial TiO2 nanoparticles to create nanocomposite materials. Hexamethyldisiloxane (HMDSO)/O-2 plasmas were used to deposit SiO2 or SiOxCyHz films, depending on the oxidant concentration; and hexylamine (HexAm) plasmas were used to deposit amorphous amine-containing polymeric films on the TiO2 nanoparticles. The composite materials were analyzed using Fourier-transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). These analyses reveal film composition on the nanoparticles was virtually identical to that deposited on flat substrates and that the films deposit a conformal coating on the nanoparticles. The performance of the nanocomposite materials was evaluated using UV-vis spectroscopy to determine the dispersion characteristics of both SiOx and HexAm coated TiO2 materials. Notably, the coated materials stay suspended longer in distilled water than the uncoated materials for all deposited films. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:2081 / 2091
页数:11
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