Negative Ion Density Measurements in Reactive Magnetron Sputtering

被引:5
作者
Dodd, Robert [1 ]
You, ShaoDong [1 ]
Bryant, Paul M. [1 ]
Bradley, James W. [1 ]
机构
[1] Univ Liverpool, Dept Elect Engn & Elect, Liverpool L69 3GJ, Merseyside, England
基金
英国工程与自然科学研究理事会;
关键词
deposition; laser ablation; magnetron; PROBE SURFACE ABLATION; DISCHARGE; OXYGEN;
D O I
10.1002/ppap.200931606
中图分类号
O59 [应用物理学];
学科分类号
摘要
A combination of laser photo-detachment and conventional Langmuir probing has been used to obtain the bulk negative ion density in both a DC and radio frequency (RF) sputter magnetron. The argon and oxygen discharges were operated at low powers and over a range of pressures. The photo-detachment signal is expected to reach a limiting value; however, the signal continues to increase with laser energy density and this can be attributed to a laser ablation effect. In the RF magnetron the electron temperature (T-e) in oxygen decreased with increasing pressure, whereas the electron density (N-e) increased from 0.53 to 8.6 x 10(14)m (3). At around 12 mTorr, a sudden increase in Ne by 3.7 is accompanied by a small drop in T-e. The negative ion density (N_) also increases with pressure reaching a maximum of 1.7 x 10(14) m(3) between 5 and 10 mTorr. Under similar conditions, the DC magnetron negative ion fraction (N_/Ne) is estimated to be similar to 0.01, being significantly lower than in the RF magnetron where N_/Ne approximate to 1.
引用
收藏
页码:S615 / S619
页数:5
相关论文
共 50 条
  • [41] Quantification of the incorporation coefficient of a reactive gas on a metallic film during magnetron sputtering: The method and results
    Leroy, W. P.
    Mahieu, S.
    Persoons, R.
    Depla, D.
    THIN SOLID FILMS, 2009, 518 (05) : 1527 - 1531
  • [42] Internal current measurements in high power impulse magnetron sputtering
    Lundin, Daniel
    Al Sahab, Seham
    Brenning, Nils
    Huo, Chunqing
    Helmersson, Ulf
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2011, 20 (04)
  • [43] Effect of the target power density on high-power impulse magnetron sputtering of copper
    Kozak, Tomas
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2012, 21 (02)
  • [44] The microstructure and wettability of the TiOx films synthesized by reactive DC magnetron sputtering
    Lin, Zeng
    Liu, Kun
    Zhang, Yi-Chen
    Yue, Xiang-Ji
    Song, Gui-Qiu
    Ba, De-Chun
    MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2009, 156 (1-3): : 79 - 83
  • [45] Reactive sputtering of titanium compounds using the magnetron system with a grounded cathode
    Chodun, Rafal
    Nowakowska-Langier, Katarzyna
    Wicher, Bartosz
    Okrasa, Sebastian
    Minikayev, Roman
    Zdunek, Krzysztof
    THIN SOLID FILMS, 2017, 640 : 73 - 80
  • [46] Tribological Properties of CrN/AlN Films Produced by Reactive Magnetron Sputtering
    Rojo, A.
    Solis, J.
    Oseguera, J.
    Salas, O.
    Reichelt, R.
    JOURNAL OF MATERIALS ENGINEERING AND PERFORMANCE, 2010, 19 (03) : 421 - 427
  • [47] Influence of Al Content on the Properties of MgO Grown by Reactive Magnetron Sputtering
    Saraiva, Marta
    Chen, Hong
    Leroy, Wouter P.
    Mahieu, Stijn
    Jehanathan, Neerushana
    Lebedev, Oleg
    Georgieva, Violeta
    Persoons, Rosita
    Depla, Diederik
    PLASMA PROCESSES AND POLYMERS, 2009, 6 : S751 - S754
  • [48] Floating potential probes for process control during reactive magnetron sputtering
    Van Bever, J.
    Vasina, P.
    Drevet, R.
    Strijckmans, K.
    Depla, D.
    SURFACE & COATINGS TECHNOLOGY, 2024, 494
  • [49] Structure and properties of duodenary (TiVCrZrNbMoHfTaWAlSi)N coatings by reactive magnetron sputtering
    Chang, Zue-Chin
    MATERIALS CHEMISTRY AND PHYSICS, 2018, 220 : 98 - 110
  • [50] Preparation and Properties of TiN Thin Films by DC Reactive Magnetron Sputtering
    Shan Yu-qiao
    Gu Xun-lei
    Wang You-xin
    MULTI-FUNCTIONAL MATERIALS AND STRUCTURES II, PTS 1 AND 2, 2009, 79-82 : 2275 - 2278