Monte Carlo Simulation of Electrons' and Ions' Trajectories in Magnetron Sputtering Systems

被引：2

作者：

Holik, Miroslav ^{[1
,2
]}

Bradley, James ^{[1
]}

Bellido-Gonzalez, Victor ^{[2
]}

Monaghan, Dermot ^{[2
]}

机构：

[1] Univ Liverpool, Liverpool L69 3GJ, Merseyside, England

[2] Gencoa Ltd, Liverpool L24 9HP, Merseyside, England

来源：

PLASMA PROCESSES AND POLYMERS | 2009年 / 6卷

关键词：

computer modelling; DC discharges; glow discharges; magnetron; molecular dynamics; sputtering; TOTAL CROSS-SECTIONS; ARGON; DISCHARGES; MODEL; AR;

D O I：

10.1002/ppap.200931905

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A 3D simulation system has been developed to study electron and ion densities and other plasma parameters in circular and rectangular magnetron sputtering systems. Typically, 10(5) particles of each species are tracked simultaneously for a time period when the plasma parameters' distributions get stabilised. During this period, the particles undergo Lorentz force and different kinds of collisions. The collisions are generated by Monte Carlo method using null-collision technique.

引用

页码：S789 / S791

页数：3

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