Inhibition of copper corrosion by isatin in aerated 0.5 M H2SO4

被引:105
作者
Quartarone, G [1 ]
Bellomi, T [1 ]
Zingales, A [1 ]
机构
[1] Univ Venice, Dept Chem, I-30123 Venice, Italy
关键词
copper; corrosion; sulphuric acid; inhibition; isatin;
D O I
10.1016/S0010-938X(02)00134-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The corrosion inhibition of commercial copper by means of isatin was studied in aerated 0.5 M H2SO4 in the temperature range 25-55 degreesC using weight-loss, potentiodynamic and spectrophotometric tests, and determination of double layer capacitance. Inhibition efficiencies up to 94% in the concentration range of 1 x 10(-4) -7.5 x 10(-3) M of isatin were obtained. The corrosion rates estimated with weight-loss measurements were higher than those correspondingly determined with the potentiodynamic test, especially at higher concentrations of inhibitor. This is in accord with other researches that have pointed out the limitation of the Tafel line extrapolation method in the determination of corrosion rates. The kinetics of cuprous and cupric ion formation and UV-visible spectra support the formation hypothesis of a complex between copper and isatin. The adsorptive behaviour of isatin on copper 0.5 M H2SO4 was also investigated. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:715 / 733
页数:19
相关论文
共 42 条
[1]  
AILOR WH, 1971, HDB CORROSION TESTIN, P178
[2]   HYDROGEN EVOLUTION ON COPPER IN H2SO4 CONTAINING BENZOTRIAZOLE [J].
ALTURA, D ;
NOBE, K .
CORROSION, 1972, 28 (09) :345-&
[3]   LIMITATION TO MIXED POTENTIAL CONCEPT OF METAL CORROSION - COPPER IN OXYGENATED SULFURIC-ACID SOLUTIONS [J].
ANDERSEN, TN ;
GHANDEHARI, MH ;
EYRING, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (12) :1580-1585
[4]  
[Anonymous], ENCY ELECTROCHEMISTR
[5]  
BIANCHI G, 1975, FONDAMENTI CORROSION, P40
[6]  
BIANCHI G, 1965, P 2 EUR S CORR INH F, P1
[7]  
BLONGREN E, 1959, J PHYS CHEM-US, V1475, P63
[8]  
Bockris J.O.M., 1972, MODERN ELECTROCHEMIS, V2, P1265
[9]  
BOCKRIS JO, 1981, COMPR TREAT, V4, P97
[10]  
BOCKRIS JOM, 1972, MODERN ELECTROCHEMIS, V2, P756