The Influence of the Energy of Ar+ Ion Implantation on the Photoluminescence of Porous Silicon

被引:0
作者
Kozhemiako, A. V. [1 ]
Shemukhin, A. A. [2 ,3 ]
Nazarov, A. V. [1 ]
Spivak, Yu. M. [4 ]
Muratova, E. N. [4 ]
Chernysh, V. V. [1 ,2 ]
机构
[1] Moscow MV Lomonosov State Univ, Dept Phys, Moscow 119991, Russia
[2] Moscow MV Lomonosov State Univ, Skobeltsyn Inst Nucl Phys, Moscow 119991, Russia
[3] Moscow MV Lomonosov State Univ, Ctr Quantum Technol, Moscow 119991, Russia
[4] St Petersburg Electrotech Univ LETI, Dept Micro & Nanoelect, St Petersburg 197376, Russia
基金
俄罗斯基础研究基金会;
关键词
porous silicon; ion implantation; photoluminescence;
D O I
10.3103/S0027134920060120
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Irradiation of porous silicon with Ar+ ions at energies from 100 to 400 keV and fluence of 10(12) cm(-2) was carried out. The effect of ion irradiation at different energies of incident particles on the photoluminescence spectrum of porous silicon has been studied. it has been shown that the photoluminescence spectrum consists of two components. One of then is associated with the presence of structural defects; another, with the surface states on the complex surface of porous silicon. A method for estimating the thickness of the luminescent layer based on the analysis of the photoluminescence peak associated with defects is proposed.
引用
收藏
页码:590 / 595
页数:6
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