Electrochemical growth and resistive switching of flat-surfaced and (111)-oriented Cu2O films

被引:34
作者
Kang, Sung-Oong [1 ]
Hong, Sahwan [1 ]
Choi, Jinsik [1 ]
Kim, Jin-Soo [1 ]
Hwang, Inrok [1 ]
Byun, Ik-Su [1 ]
Yun, Kyu-Sik [2 ]
Park, Bae Ho [1 ]
机构
[1] Konkuk Univ, Dept Phys, Div Quantum Phases & Devices, Seoul 143701, South Korea
[2] Kyungwon Univ, Coll Bionano Technol, Songnam 461701, South Korea
基金
瑞典研究理事会;
关键词
EPITAXIAL ELECTRODEPOSITION; OXIDE; TRANSITION; COPPER;
D O I
10.1063/1.3202394
中图分类号
O59 [应用物理学];
学科分类号
摘要
Flat-surfaced and fully (111)-oriented Cu2O films were grown through a chelate-assisted electrochemical approach. Based on key roles of chelating agent, the flat surface of films controlled over the columnar-grained growth was obtainable with a root-mean-square roughness value below 3 nm. Cu2O films treated by a rapid-thermal-annealing process at 200 degrees C exhibited unipolar switching I-V characteristics, presenting the bistable resistance states with a high resistance ratio (R-off/R-on) over 3 orders of magnitude and considerably stable switching properties within 100 switching cycles. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3202394]
引用
收藏
页数:3
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